Determination of the surface diffusion coefficient and the residence time of adsorbates via local focused electron beam induced chemical vapour deposition.

In this paper we present a model for local gas assisted focused electron beam induced deposition which allows estimating the surface diffusion coefficient and the residence time of volatile precursor adsorbates. Elaborating the existing continuum model for one adsorbate species and using a novel set of parameters we simplified the differential equation describing the dynamics of this process. We will show that stationary exposure experiments do not allow for a unique determination of the parameters residence time, surface diffusion coefficient, and net cross-section. Rather an estimation of parameter windows is possible by assuming meaningful values for the electron dissociation cross section. The model was applied to the experimental results for Cu(hfac)2 as a gas precursor.