Toth Milos, Lobo Charlene, Friedli Vinzenz, Szkudlarek Aleksandra, Utke Ivo
School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland.
Beilstein J Nanotechnol. 2015 Jul 14;6:1518-40. doi: 10.3762/bjnano.6.157. eCollection 2015.
Focused electron beam induced processing (FEBIP) is a suite of direct-write, high resolution techniques that enable fabrication and editing of nanostructured materials inside scanning electron microscopes and other focused electron beam (FEB) systems. Here we detail continuum techniques that are used to model FEBIP, and release software that can be used to simulate a wide range of processes reported in the FEBIP literature. These include: (i) etching and deposition performed using precursors that interact with a surface through physisorption and activated chemisorption, (ii) gas mixtures used to perform simultaneous focused electron beam induced etching and deposition (FEBIE and FEBID), and (iii) etch processes that proceed through multiple reaction pathways and generate a number of reaction products at the substrate surface. We also review and release software for Monte Carlo modeling of the precursor gas flux which is needed as an input parameter for continuum FEBIP models.
聚焦电子束诱导加工（FEBIP）是一套直写式高分辨率技术，可在扫描电子显微镜和其他聚焦电子束（FEB）系统内制造和编辑纳米结构材料。在此，我们详细介绍了用于对FEBIP进行建模的连续介质技术，并发布了可用于模拟FEBIP文献中报道的各种过程的软件。这些过程包括：（i）使用通过物理吸附和活化化学吸附与表面相互作用的前驱体进行蚀刻和沉积，（ii）用于同时进行聚焦电子束诱导蚀刻和沉积（FEBIE和FEBID）的气体混合物，以及（iii）通过多种反应途径进行并在衬底表面产生多种反应产物的蚀刻过程。我们还审查并发布了用于前驱体气体通量蒙特卡罗建模的软件，该通量是连续介质FEBIP模型的输入参数。
