Scillato Daniele, Licciardello Nadia, Catalano Maria R, Condorelli Guglielmo G, Lo Nigro Raffaella, Malandrino Graziella
Dipartimento di Scienze Chimiche, Universitá Catania, ISTM-CNR, and INSTM UdR Catania, Viale A. Doria 6, 1-95125 Catania, Italy.
J Nanosci Nanotechnol. 2011 Sep;11(9):8221-5. doi: 10.1166/jnn.2011.5048.
Metal-Organic Chemical Vapor Deposition (MOCVD) has been applied to the fabrication of BiFeO3 films undoped and doped with Ba or Ti on SrTiO3 (100) and YSZ (100) substrates. The films have been deposited using a multi-metal source, consisting of the Bi(phenyl)3, Fe(tmhd)3 and Ba(hfa)2 tetraglyme or Ti(tmhd)2(O-iPr)2 (phenyl = -C6H5, H-tmhd = 2,2,6,6-tetramethyl-3,5-heptandione; O-iPr = iso-propoxide; H-hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme = CH3O(CH2CH2O)4CH3) precursor mixture. The structural and morphological characterization of films has been carried out using X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM). Chemical compositional studies have been performed by energy dispersive X-ray (EDX) analysis. Structural and morphological characterizations point to the formation of homogeneous and flat surfaces for both undoped and doped BiFeO3 films.
金属有机化学气相沉积（MOCVD）已应用于在SrTiO3（100）和YSZ（100）衬底上制备未掺杂以及掺杂Ba或Ti的BiFeO3薄膜。这些薄膜是使用由Bi（苯基）3、Fe（tmhd）3和Ba（hfa）2四甘醇二甲醚或Ti（tmhd）2（O-iPr）2（苯基 = -C6H5，H-tmhd = 2,2,6,6-四甲基-3,5-庚二酮；O-iPr = 异丙醇盐；H-hfa = 1,1,1,5,5,5-六氟-2,4-戊二酮；四甘醇二甲醚 = CH3O（CH2CH2O）4CH3）前驱体混合物组成的多金属源沉积而成的。已使用X射线衍射（XRD）和场发射扫描电子显微镜（FESEM）对薄膜进行了结构和形态表征。通过能量色散X射线（EDX）分析进行了化学成分研究。结构和形态表征表明，未掺杂和掺杂的BiFeO3薄膜均形成了均匀且平整的表面。
