Petrossians Artin, Whalen John J, Weiland James D, Mansfeld Florian
Chemical Engineering and Materials Science Department, University of Southern California, Los Angeles, CA 90089, USA.
Annu Int Conf IEEE Eng Med Biol Soc. 2011;2011:3001-4. doi: 10.1109/IEMBS.2011.6090823.
High-surface area platinum-iridium alloys were electrodeposited by on Pt and Au microelectrodes using a potential sweep technique. Detailed investigations of the structure and morphology and the electrochemical properties of the electrodeposited Pt-Ir alloy coatings were performed. Scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) were used for the determination of the surface morphology and the chemical composition of the Pt-Ir coatings, respectively. The elemental analysis by EDS showed a nearly 60-40% Pt-Ir composition of the coatings. The electrochemical properties of the Pt-Ir coatings were evaluated using cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS). CV and EIS measurements revealed that the Pt-Ir coated electrodes exhibit significantly increased charge storage capacity and real surface area compared to uncoated Pt electrodes. Charge injection experiments of the Pt-Ir coated microelectrodes revealed low potential excursions, indicating high charge injection capabilities within safe potential limits.
采用电位扫描技术在铂和金微电极上电沉积高表面积铂铱合金。对电沉积的铂铱合金涂层的结构、形貌和电化学性能进行了详细研究。分别使用扫描电子显微镜（SEM）和能量色散光谱（EDS）来测定铂铱涂层的表面形貌和化学成分。EDS的元素分析表明涂层的铂铱成分接近60-40%。使用循环伏安法（CV）和电化学阻抗谱（EIS）评估铂铱涂层的电化学性能。CV和EIS测量结果表明，与未涂层的铂电极相比，铂铱涂层电极的电荷存储容量和真实表面积显著增加。铂铱涂层微电极的电荷注入实验显示出低电位偏移，表明在安全电位范围内具有高电荷注入能力。
