Clinic of Fixed and Removable Prosthodontics and Dental Material Science, Institut of Social and Preventive Medicine, University of Zurich, Zurich, Switzerland.
Acta Odontol Scand. 2013 Jan;71(1):102-12. doi: 10.3109/00016357.2011.654248. Epub 2012 Feb 27.
This study tested whether the two-body wear of monolithic zirconia and their corresponding enamel antagonists was higher compared to monolithic alloy and veneered zirconia.
Cylindrical specimens (N = 36, n = 6) were prepared out of (A) veneered zirconia (VZ), (B) glazed zirconia using a glaze ceramic (GZC), (C) glazed zirconia using a glaze spray (GZS), (D) manually polished monolithic zirconia (MAZ), (E) mechanically polished monolithic zirconia (MEZ) and (F) monolithic base alloy (control group, MA). Wear tests were performed in a chewing simulator (49 N, 1.7 Hz, 5°C/50°C) with enamel antagonists. The wear analysis was performed using a 3D profilometer before and after 120,000, 240,000, 640,000 and 1,200,000 masticatory cycles. SEM images were used for evaluating wear qualitatively. The longitudinal results were analysed using linear mixed models (α = 0.05).
Materials (p < 0.001) and number of masticatory cycles (p < 0.001) had a significant effect on the wear level. The least enamel antagonist wear was observed for MAZ and MEZ (27.3 ± 15.2, 28 ± 11.1 μm, respectively). GZC (118 ± 30.9 μm) showed the highest wear of enamel antagonists. The highest wear rate in the material was observed in GZS (91.3 ± 38.6 μm). While in the groups of MA, VZ, GZC and GZS 50% of the specimens developed cracks in enamel, it was 100% in MAZ and MEZ groups.
Polished monolithic zirconia showed lower wear rate on enamel antagonists as well as within the material itself but developed higher rates of enamel cracks.
本研究旨在测试整体氧化锆及其相应釉质拮抗物的双体磨损是否高于整体合金和贴面氧化锆。
从（A）贴面氧化锆（VZ）、（B）釉面氧化锆（使用釉料陶瓷，GZC）、（C）釉面氧化锆（使用釉料喷雾，GZS）、（D）手动抛光整体氧化锆（MAZ）、（E）机械抛光整体氧化锆（MEZ）和（F）整体基底合金（对照组，MA）中制备出圆柱形试件（N = 36，n = 6）。在咀嚼模拟器（49 N，1.7 Hz，5°C/50°C）中用釉质拮抗物进行磨损试验。在 120,000、240,000、640,000 和 1,200,000 咀嚼循环前后，使用三维轮廓仪进行磨损分析。使用扫描电子显微镜（SEM）图像对磨损进行定性评估。使用线性混合模型（α = 0.05）对纵向结果进行分析。
材料（p < 0.001）和咀嚼循环次数（p < 0.001）对磨损水平有显著影响。MAZ 和 MEZ 的釉质拮抗物磨损最小（27.3 ± 15.2、28 ± 11.1 μm）。GZC（118 ± 30.9 μm）显示出最高的釉质拮抗物磨损。在 GZS 组中，材料的磨损率最高（91.3 ± 38.6 μm）。MA、VZ、GZC 和 GZS 组中有 50%的标本出现釉质裂纹，而 MAZ 和 MEZ 组则为 100%。
抛光整体氧化锆在釉质拮抗物和材料本身的磨损率较低，但釉质裂纹发生率较高。
