Tseng Yuan Heng, Shen Wen Chao, Lin Chrong Jung
J Appl Phys. 2012 Apr 1;111(7):73701-737015. doi: 10.1063/1.3691224. Epub 2012 Apr 2.
The intense development and study of resistive random access memory (RRAM) devices has opened a new era in semiconductor memory manufacturing. Resistive switching and carrier conduction inside RRAM films have become critical issues in recent years. Electron trapping/detrapping behavior is observed and investigated in the proposed contact resistive random access memory (CR-RAM) cell. Through the fitting of the space charge limiting current (SCLC) model, and analysis in terms of the random telegraph noise (RTN) model, the temperature-dependence of resistance levels and the high-temperature data retention behavior of the contact RRAM film are successfully and completely explained. Detail analyses of the electron capture and emission from the traps by forward and reverse read measurements provide further verifications for hopping conduction mechanism and current fluctuation discrepancies.
电阻式随机存取存储器(RRAM)器件的深入发展与研究开启了半导体存储器制造的新纪元。近年来,RRAM 薄膜内部的电阻开关和载流子传导已成为关键问题。在所提出的接触电阻式随机存取存储器(CR-RAM)单元中观察并研究了电子俘获/去俘获行为。通过对空间电荷限制电流(SCLC)模型的拟合,并依据随机电报噪声(RTN)模型进行分析,成功且全面地解释了接触 RRAM 薄膜电阻水平的温度依赖性以及高温数据保持行为。通过正向和反向读取测量对陷阱中电子俘获和发射的详细分析,为跳跃传导机制和电流波动差异提供了进一步验证。