Singer Jonathan P, Lee Jae-Hwang, Kooi Steven E, Thomas Edwin L
Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
Opt Express. 2012 May 7;20(10):11097-108. doi: 10.1364/OE.20.011097.
For the next generation of phoXonic, plasmonic, opto-mechanical and microfluidic devices, the capability to create 3D microstructures is highly desirable. Fabrication of such structures by conventional top-down techniques generally requires multiple time-consuming steps and is limited in the ability to define features spanning multiple layers at prescribed angles. 3D direct write lithography (3DDW) has the capability to draw nearly arbitrary structures, but is an inherently slow serial writing process. Here we present a method, denoted focused proximity field nanopatterning (FPnP), that combines 3DDW with single or multiphoton interference lithography (IL). By exposing a thick photoresist layer having a phase mask pattern imprinted on its surface with a tightly focused laser beam, we produce locally unique complex structures. The morphology can be varied based on beam and mask parameters. Patterns may be written rapidly in a single shot mode with arbitrary positions defined by the direct write, thus exploiting the control of 3DDW with the enhanced speed of phase mask IL. Here we show the ability for this technique to rapidly produce arrays of "stand-up" far IR resonators.
对于下一代光子、等离子体、光机械和微流体设备而言，制造三维微结构的能力是非常必要的。采用传统的自上而下技术制造此类结构通常需要多个耗时的步骤，并且在以规定角度定义跨越多个层的特征方面能力有限。三维直写光刻（3DDW）能够绘制几乎任意的结构，但本质上是一种缓慢的串行写入过程。在此，我们提出一种称为聚焦近场纳米图案化（FPnP）的方法，该方法将3DDW与单光子或多光子干涉光刻（IL）相结合。通过用紧密聚焦的激光束照射表面印有相位掩模图案的厚光刻胶层，我们可以产生局部独特的复杂结构。其形态可以根据光束和掩模参数而变化。图案可以在单次曝光模式下快速写入，通过直写定义任意位置，从而利用3DDW的控制能力以及相位掩模IL的更高速度。在此，我们展示了该技术快速制造“直立”远红外谐振器阵列的能力。
