School of Physics and Advanced Materials, University of Technology, Sydney, Broadway, New South Wales 2007, Australia.
Nanotechnology. 2012 Sep 21;23(37):375302. doi: 10.1088/0957-4484/23/37/375302. Epub 2012 Aug 24.
We report the use of ammonia (NH(3)) vapor as a new precursor for nanoscale electron beam induced etching (EBIE) of carbon, and an efficient imaging medium for environmental scanning electron microscopy (ESEM). Etching is demonstrated using amorphous carbonaceous nanowires grown by electron beam induced deposition (EBID). It is ascribed to carbon volatilization by hydrogen radicals generated by electron dissociation of NH(3) adsorbates. The volatilization process is also effective at preventing the buildup of residual hydrocarbon impurities that often compromise EBIE, EBID and electron imaging. We also show that ammonia is a more efficient electron imaging medium than H(2)O, which up to now has been the most commonly used ESEM imaging gas.
我们报告了使用氨（NH（3））蒸气作为纳米尺度电子束诱导刻蚀（EBIE）碳的新前体，以及环境扫描电子显微镜（ESEM）的有效成象介质。使用电子束诱导沉积（EBID）生长的非晶碳纳米线进行了刻蚀。它归因于由 NH（3）吸附物的电子离解产生的氢自由基引起的碳挥发。该挥发过程对于防止经常破坏 EBIE、EBID 和电子成像的残留碳氢化合物杂质的积聚也非常有效。我们还表明，氨比 H（2）O 更有效地作为电子成象介质，迄今为止，H（2）O 一直是最常用的 ESEM 成象气体。
