Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan.
Langmuir. 2012 Oct 9;28(40):14313-22. doi: 10.1021/la302099y. Epub 2012 Sep 25.
Poly(4-benzoyl-p-xylylene-co-p-xylylene), a biologically compatible photoreactive polymer belonging to the parylene family, can be deposited using a chemical vapor deposition (CVD) polymerization process on a wide range of substrates. This study discovered that the solvent stability of poly(4-benzoyl-p-xylylene-co-p-xylylene) in acetone is significantly increased when exposed to approximately 365 nm of UV irradiation, because of the cross-linking of benzophenone side chains with adjacent molecules. This discovery makes the photodefinable polymer a powerful tool for use as a negative photoresist for surface microstructuring and biointerface engineering purposes. The polymer is extensively characterized using infrared reflection adsorption spectroscopy (IRRAS), scanning electron microscopy (SEM), and imaging ellipsometry. Furthermore, the vapor-based polymer coating process provides access to substrates with unconventional and complex three-dimensional (3D) geometries, as compared to conventional spin-coated resists that are limited to flat 2D assemblies. Moreover, this photoresist technology is seamlessly integrated with other functionalized parylenes including aldehyde-, acetylene-, and amine-functionalized parylenes to create unique surface microstructures that are chemically and topographically defined. The photopatterning and immobilization protocols described in this paper represent an approach that avoids contact between harmful substances (such as solvents and irradiations) and sensitive biomolecules. Finally, multiple biomolecules on planar substrates, as well as on unconventional 3D substrates (e.g., stents), are presented.
聚（4-苯甲酰基-p-二甲苯-co-p-二甲苯）是一种生物相容性的光反应性聚合物，属于对二甲苯家族，可以通过化学气相沉积（CVD）聚合工艺沉积在各种基底上。本研究发现，当暴露在约 365nm 的紫外光下时，聚（4-苯甲酰基-p-二甲苯-co-p-二甲苯）在丙酮中的溶剂稳定性显著提高，这是因为苯甲酮侧链与相邻分子的交联。这一发现使得可光定义的聚合物成为用于表面微结构和生物界面工程目的的负性光致抗蚀剂的有力工具。该聚合物使用红外反射吸收光谱（IRRAS）、扫描电子显微镜（SEM）和成像椭圆光度法进行了广泛的表征。此外，与传统的仅限于二维（2D）组装的旋涂抗蚀剂相比，基于蒸气的聚合物涂层工艺可用于具有非常规和复杂三维（3D）几何形状的基底。此外，这种光致抗蚀剂技术与其他官能化的对二甲苯（包括醛基、乙炔基和胺基官能化的对二甲苯）无缝集成，可创建具有化学和形貌定义的独特表面微观结构。本文中描述的光图案化和固定化方案代表了一种避免有害物质（如溶剂和辐射）与敏感生物分子接触的方法。最后，在平面基底以及非常规 3D 基底（如支架）上展示了多种生物分子。
