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F3MX 分子(M = C、Si、Ge 和 X = F、Cl、Br、I)中 σ 空穴强度和相互作用的趋势。

Trends in σ-hole strengths and interactions of F3MX molecules (M = C, Si, Ge and X = F, Cl, Br, I).

机构信息

Computational Chemistry Group, Department of Chemistry, University of Mauritius, Reduit, Mauritius.

出版信息

J Mol Model. 2013 Jul;19(7):2739-46. doi: 10.1007/s00894-012-1571-4. Epub 2012 Sep 12.

DOI:10.1007/s00894-012-1571-4
PMID:22968690
Abstract

It is well-established that many covalently-bonded atoms of Groups IV-VII have directionally-specific regions of positive electrostatic potential (σ-holes) through which they can interact with negative sites. In the case of Group VII, this is called "halogen bonding." We have studied two series of molecules: the F3MX and, for comparison, the H3MX (M = C, Si and Ge; X = F, Cl, Br and I). Our objective was to determine how the interplay between M and X in each molecule affects the σ-holes of both, and consequently their interactions with the nitrogen lone pair of HCN. We find that the relative electronegativities of M and X are not sufficient to explain their effects upon each other's σ-holes; consideration of charge capacity/polarizability (and perhaps other factors) also appears to be necessary. However the results do support the description of normal σ-hole interactions as being largely electrostatically-driven.

摘要

人们已经充分认识到,第 IV-VII 族的许多共价键原子都具有带正静电势的方向性特定区域(σ 空穴),可以通过这些区域与负电荷点相互作用。对于第 VII 族,这种相互作用被称为“卤键”。我们研究了两类分子:F3MX 和,作为比较,H3MX(M = C、Si 和 Ge;X = F、Cl、Br 和 I)。我们的目的是确定每个分子中 M 和 X 之间的相互作用如何影响两者的 σ 空穴,进而影响它们与 HCN 的氮孤对的相互作用。我们发现,M 和 X 的相对电负性不足以解释它们对彼此的 σ 空穴的影响;考虑电荷容量/极化率(也许还有其他因素)似乎也是必要的。然而,这些结果确实支持将正常的 σ 空穴相互作用主要描述为静电驱动。

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