Döring Sven, Szilagyi John, Richter Sören, Zimmermann Felix, Richardson Martin, Tünnermann Andreas, Nolte Stefan
Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universität Jena, Jena, Germany.
Opt Express. 2012 Nov 19;20(24):27147-54. doi: 10.1364/OE.20.027147.
A detailed study of the influence of the pulse duration, from the femtosecond to the nanosecond regime, on the evolution of the hole shape and depth during percussion drilling in silicon is presented. Real-time backlight imaging of the hole development is obtained for holes up to 2 mm deep with aspect ratios extending to 25:1. For low pulse energies, the hole-shape and drilling characteristics are similar for femtosecond, picoseconds and nanosecond regimes. At higher pulse energies, ns-pulses exhibit slower average drilling rates but eventually reach greater final depths. The shape of these holes is however dominated by branching and large internal cavities. For ps-pulses, a cylindrical shape is maintained with frequent small bulges on the side-walls. In contrast, fs-pulses cause only a limited number of imperfections on a tapered hole shape.
本文详细研究了从飞秒到纳秒脉冲持续时间对硅材料冲击钻孔过程中孔形状和深度演变的影响。通过实时背光成像获得了深度达2毫米、纵横比达25:1的孔的孔形成过程。对于低脉冲能量,飞秒、皮秒和纳秒脉冲 regime下的孔形状和钻孔特性相似。在较高脉冲能量下,纳秒脉冲的平均钻孔速率较慢,但最终能达到更大的最终深度。然而,这些孔的形状主要由分支和大的内部空洞主导。对于皮秒脉冲,孔保持圆柱形,侧壁上有频繁的小凸起。相比之下,飞秒脉冲在锥形孔形状上仅产生有限数量的缺陷。