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通过导电原子力显微镜方法研究纳米尺度忆阻器的记忆效应。

The memory effect of nanoscale memristors investigated by conducting scanning probe microscopy methods.

机构信息

International Center for Young Scientists, National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan ; Institut de Ciència de Materials de Barcelona, CSIC, Campus de la UAB, 08193 Bellaterra, Spain.

出版信息

Beilstein J Nanotechnol. 2012;3:722-30. doi: 10.3762/bjnano.3.82. Epub 2012 Nov 6.

Abstract

We report on the use of scanning force microscopy as a versatile tool for the electrical characterization of nanoscale memristors fabricated on ultrathin La(0.7)Sr(0.3)MnO(3) (LSMO) films. Combining conventional conductive imaging and nanoscale lithography, reversible switching between low-resistive (ON) and high-resistive (OFF) states was locally achieved by applying voltages within the range of a few volts. Retention times of several months were tested for both ON and OFF states. Spectroscopy modes were used to investigate the I-V characteristics of the different resistive states. This permitted the correlation of device rectification (reset) with the voltage employed to induce each particular state. Analytical simulations by using a nonlinear dopant drift within a memristor device explain the experimental I-V bipolar cycles.

摘要

我们报告了扫描力显微镜作为一种通用工具在纳米级忆阻器电特性研究中的应用,这些忆阻器是在超薄 La(0.7)Sr(0.3)MnO(3) (LSMO) 薄膜上制造的。通过在几伏特范围内施加电压,结合传统的导电成像和纳米级光刻技术,我们实现了低阻(ON)和高阻(OFF)状态之间的可逆切换。我们对 ON 和 OFF 两种状态都进行了数月的保持时间测试。我们使用光谱模式研究了不同电阻状态的 I-V 特性。这使得我们能够将器件的整流(重置)与用于诱导每种特定状态的电压相关联。通过使用忆阻器器件中的非线性掺杂漂移进行分析模拟,解释了实验中的 I-V 双极性循环。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ae29/3512122/f608cf764ece/Beilstein_J_Nanotechnol-03-722-g002.jpg

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