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金属/氧化物/金属纳米器件的忆阻开关机制

Memristive switching mechanism for metal/oxide/metal nanodevices.

作者信息

Yang J Joshua, Pickett Matthew D, Li Xuema, Ohlberg Douglas A A, Stewart Duncan R, Williams R Stanley

机构信息

Hewlett-Packard Laboratories, Palo Alto, California 94304, USA.

出版信息

Nat Nanotechnol. 2008 Jul;3(7):429-33. doi: 10.1038/nnano.2008.160. Epub 2008 Jun 15.

Abstract

Nanoscale metal/oxide/metal switches have the potential to transform the market for nonvolatile memory and could lead to novel forms of computing. However, progress has been delayed by difficulties in understanding and controlling the coupled electronic and ionic phenomena that dominate the behaviour of nanoscale oxide devices. An analytic theory of the 'memristor' (memory-resistor) was first developed from fundamental symmetry arguments in 1971, and we recently showed that memristor behaviour can naturally explain such coupled electron-ion dynamics. Here we provide experimental evidence to support this general model of memristive electrical switching in oxide systems. We have built micro- and nanoscale TiO2 junction devices with platinum electrodes that exhibit fast bipolar nonvolatile switching. We demonstrate that switching involves changes to the electronic barrier at the Pt/TiO2 interface due to the drift of positively charged oxygen vacancies under an applied electric field. Vacancy drift towards the interface creates conducting channels that shunt, or short-circuit, the electronic barrier to switch ON. The drift of vacancies away from the interface annilihilates such channels, recovering the electronic barrier to switch OFF. Using this model we have built TiO2 crosspoints with engineered oxygen vacancy profiles that predictively control the switching polarity and conductance.

摘要

纳米级金属/氧化物/金属开关有潜力变革非易失性存储器市场,并可能带来新型计算形式。然而,由于在理解和控制主导纳米级氧化物器件行为的电子与离子耦合现象方面存在困难,进展有所延迟。“忆阻器”(记忆电阻器)的解析理论最初于1971年从基本对称性论证中发展而来,我们最近表明忆阻器行为能够自然地解释这种电子 - 离子耦合动力学。在此,我们提供实验证据来支持氧化物系统中忆阻式电开关的这一通用模型。我们构建了带有铂电极的微米级和纳米级二氧化钛结器件,这些器件表现出快速双极非易失性开关特性。我们证明,开关过程涉及在施加电场下带正电的氧空位漂移导致铂/二氧化钛界面处电子势垒的变化。空位向界面漂移会形成导电通道,这些通道会分流或短路电子势垒从而实现导通。空位从界面处漂移离开会消除此类通道,恢复电子势垒从而实现关断。利用该模型,我们构建了具有工程化氧空位分布的二氧化钛交叉点,可预测性地控制开关极性和电导。

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