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高掺硼纳米晶硅中电导率和塞贝克系数的同时增加。

Simultaneous increase in electrical conductivity and Seebeck coefficient in highly boron-doped nanocrystalline Si.

机构信息

Institute for Microelectronics, Technical University of Vienna, Vienna A-1040, Austria.

出版信息

Nanotechnology. 2013 May 24;24(20):205402. doi: 10.1088/0957-4484/24/20/205402. Epub 2013 Apr 19.

Abstract

A large thermoelectric power factor in heavily boron-doped p-type nanograined Si with grain sizes ∼30 nm and grain boundary regions of ∼2 nm is reported. The reported power factor is ∼5 times higher than in bulk Si. It originates from the surprising observation that for a specific range of carrier concentrations, the electrical conductivity and Seebeck coefficient increase simultaneously. The two essential ingredients for this observation are nanocrystallinity and extremely high boron doping levels. This experimental finding is interpreted within a theoretical model that considers both electron and phonon transport within the semiclassical Boltzmann approach. It is shown that transport takes place through two phases so that high conductivity is achieved in the grains, and high Seebeck coefficient by the grain boundaries. This together with the drastic reduction in the thermal conductivity due to boundary scattering could lead to a significant increase of the figure of merit ZT. This is one of the rare observations of a simultaneous increase in the electrical conductivity and Seebeck coefficient, resulting in enhanced thermoelectric power factor.

摘要

本文报道了在晶粒尺寸约为 30nm、晶界约为 2nm 的重掺硼 p 型纳米晶粒硅中具有很大的热电功率因子。报道的功率因子比体硅高约 5 倍。它源于一个令人惊讶的观察结果,即在特定的载流子浓度范围内,电导率和塞贝克系数同时增加。这一观察结果的两个基本要素是纳米晶和极高的硼掺杂水平。这一实验发现可以用半经典玻尔兹曼方法来解释,该方法同时考虑了电子和声子的输运。结果表明,输运是通过两个相进行的,从而在晶粒中实现了高电导率,而在晶界处实现了高塞贝克系数。这再加上由于边界散射导致的热导率的急剧降低,可能会导致品质因数 ZT 的显著增加。这是同时提高电导率和塞贝克系数,从而增强热电功率因子的罕见观察结果之一。

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