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块体硫族化物玻璃的亚微米软光刻技术。

Sub-micrometer soft lithography of a bulk chalcogenide glass.

作者信息

Kohoutek Tomas, Orava Jiri, Greer A Lindsay, Fudouzi Hiroshi

机构信息

Centre for Materials and Nanotechnologies, Faculty of Chemical Technology, University of Pardubice, CS. Legion’s sq. 565, Pardubice 532 10, Czech Republic.

出版信息

Opt Express. 2013 Apr 22;21(8):9584-91. doi: 10.1364/OE.21.009584.

Abstract

We demonstrate, for the first time, time- and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of sub-micrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe(2) bulk glass at temperature 225°C, i.e. 5°C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, anti-reflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing.

摘要

我们首次展示了一种具有时间和成本效益的方法,能够将软质聚二甲基硅氧烷(PDMS)模具上的亚微米级特征复制到大面积的块状硫系玻璃上。周期为625纳米、振幅为45纳米且表面粗糙度为3纳米的亚微米级线条周期性阵列(衍射光栅)被压印到硫系AsSe(2)块状玻璃表面,温度为225°C,即比玻璃软化点低5°C。对硫系块状玻璃进行亚微米级软光刻显示出良好的可靠性、可重复性,并有望用于各种色散光学元件、抗反射表面、二维光子结构以及用于增强光子特性和化学传感的纳米结构表面的可行制造。

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