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通过有机官能化硅烷对光刻氧化硅纳米结构进行选择性表面修饰。

Selective surface modification of lithographic silicon oxide nanostructures by organofunctional silanes.

机构信息

Center for Nanostructured Materials and Analytics, Institute of Physics, Chemnitz University of Technology Reichenhainer Str. 70, 09126 Chemnitz, Germany.

出版信息

Beilstein J Nanotechnol. 2013 Mar 25;4:218-26. doi: 10.3762/bjnano.4.22. Print 2013.

DOI:10.3762/bjnano.4.22
PMID:23616941
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC3628979/
Abstract

This study investigates the controlled chemical functionalization of silicon oxide nanostructures prepared by AFM-anodization lithography of alkyl-terminated silicon. Different conditions for the growth of covalently bound mono-, multi- or submonolayers of distinctively functional silane molecules on nanostructures have been identified by AFM-height investigations. Routes for the preparation of methyl- or amino-terminated structures or silicon surfaces are presented and discussed. The formation of silane monolayers on nanoscopic silicon oxide nanostructures was found to be much more sensitive towards ambient humidity than, e.g., the silanization of larger OH-terminated silica surfaces. Amino-functionalized nanostructures have been successfully modified by the covalent binding of functional fluorescein dye molecules. Upon excitation, the dye-functionalized structures show only weak fluorescence, which may be an indication of a relatively low surface coverage of the dye molecules on length scale that is not accessible by standard AFM measurements.

摘要

本研究调查了通过 AFM 阳极氧化光刻对烷基封端硅制备的氧化硅纳米结构进行的受控化学功能化。通过 AFM 高度研究,确定了在纳米结构上生长共价结合的单、多或亚单层不同功能硅烷分子的不同条件。介绍并讨论了制备甲基或氨基封端结构或硅表面的途径。与例如较大的 OH 封端二氧化硅表面的硅烷化相比,发现硅烷单层在纳米尺度氧化硅纳米结构上的形成对环境湿度更为敏感。通过共价键合功能荧光染料分子成功修饰了氨基功能化的纳米结构。激发后,染料功能化的结构仅显示出较弱的荧光,这可能表明染料分子在标准 AFM 测量无法达到的长度尺度上的表面覆盖率相对较低。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/c19c7bdd6f14/Beilstein_J_Nanotechnol-04-218-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/35c522abdf14/Beilstein_J_Nanotechnol-04-218-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/5a9b959a90a2/Beilstein_J_Nanotechnol-04-218-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/2b6637e724f2/Beilstein_J_Nanotechnol-04-218-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/39a17390f0ce/Beilstein_J_Nanotechnol-04-218-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/2075e7f5eb8f/Beilstein_J_Nanotechnol-04-218-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/532e72fb3203/Beilstein_J_Nanotechnol-04-218-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/c19c7bdd6f14/Beilstein_J_Nanotechnol-04-218-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/35c522abdf14/Beilstein_J_Nanotechnol-04-218-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/5a9b959a90a2/Beilstein_J_Nanotechnol-04-218-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/2b6637e724f2/Beilstein_J_Nanotechnol-04-218-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/39a17390f0ce/Beilstein_J_Nanotechnol-04-218-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/2075e7f5eb8f/Beilstein_J_Nanotechnol-04-218-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/532e72fb3203/Beilstein_J_Nanotechnol-04-218-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/00a2/3628979/c19c7bdd6f14/Beilstein_J_Nanotechnol-04-218-g008.jpg

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