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掺杂石墨烯电子性质的 3N 规则。

A 3N rule for the electronic properties of doped graphene.

机构信息

State Key Laboratory of Applied Organic Chemistry (SKLAOC), College of Chemistry and Chemical Engineering, Lanzhou University, Lanzhou, Gansu 730000, People's Republic of China.

出版信息

Nanotechnology. 2013 Jun 7;24(22):225705. doi: 10.1088/0957-4484/24/22/225705. Epub 2013 May 3.

Abstract

Doping a graphene sheet with different atoms is a promising method for tuning its electronic properties. We report a first-principle investigation on the electronic properties of N, B, S, Al, Si or P doped graphene. It is revealed that the doped graphene can show an interesting physical regularity, which can be described by a simple 3N rule: a doped graphene has a zero gap or a neglectable gap at the Dirac point when its primitive cell is 3N × 3N (N is an integer), otherwise there is a gap tunable by the dopant concentration. This unique 3N rule provides a useful guideline for the design of doped graphene for electronic applications.

摘要

用不同的原子掺杂石墨烯是调节其电子性质的一种很有前途的方法。我们报告了第一性原理对 N、B、S、Al、Si 或 P 掺杂石墨烯电子性质的研究。结果表明,掺杂石墨烯可以表现出有趣的物理规律,可以用一个简单的 3N 规则来描述:当原始单元为 3N×3N(N 是整数)时,掺杂石墨烯在狄拉克点处具有零带隙或可忽略的带隙,否则带隙可以通过掺杂浓度来调节。这个独特的 3N 规则为设计用于电子应用的掺杂石墨烯提供了有用的指导。

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