Applied Physical Chemistry, School of Chemical Science and Engineering, KTH Royal Institute of Technology, Stockholm, Sweden.
Phys Chem Chem Phys. 2013 Aug 14;15(30):12674-9. doi: 10.1039/c3cp51616d.
Presently and for the foreseeable future, hydrogen peroxide and transition metal oxides are important constituents of energy production processes. In this work, the effect of the presence of HO radical scavengers on the product yield from the decomposition of H2O2 on metal oxide surfaces in aqueous solution was examined experimentally. Scavenging the intermediate product HO˙ by means of Tris or TAPS buffer leads to enhanced formation of H2. In parallel, a decrease in the production of the main gaseous product O2 is observed. Under these conditions, H2 formation is a spontaneous process even at room temperature. The yields of both the H2 and O2 depend on the concentration of Tris or TAPS in the reaction media. We observed that TAPS has a higher affinity for the surface of ZrO2 than does Tris. The difference in adsorption of both scavengers is reflected by the difference in their influence on the product yields. The observed sensitivity of the system H2O2-ZrO2 towards the two different scavengers indicates that O2 and H2 are formed at different types of surface sites.
目前及可预见的未来,过氧化氢和过渡金属氧化物是能源生产过程中的重要组成部分。在这项工作中,通过实验研究了 HO 自由基清除剂存在时,HO 自由基清除剂对金属氧化物表面在水溶液中分解 H2O2 产物产率的影响。通过 Tris 或 TAPS 缓冲液清除中间产物 HO˙会导致 H2 的形成增加。同时,主要气态产物 O2 的生成量减少。在这些条件下,H2 的形成甚至在室温下也是自发的过程。H2 和 O2 的产率都取决于反应介质中 Tris 或 TAPS 的浓度。我们观察到 TAPS 对 ZrO2 表面的亲和力高于 Tris。两种清除剂吸附的差异反映在它们对产物产率的影响差异上。观察到 H2O2-ZrO2 体系对两种不同清除剂的敏感性表明,O2 和 H2 是在不同类型的表面位点形成的。