Electrical and Computer Engineering, University of Houston, Houston, Texas, United States of America.
PLoS One. 2013 Aug 14;8(8):e73083. doi: 10.1371/journal.pone.0073083. eCollection 2013.
We describe a low-energy glow-discharge process using reactive ion etching system that enables non-circular device patterns, such as squares or hexagons, to be formed from a precursor array of uniform circular openings in polymethyl methacrylate, PMMA, defined by electron beam lithography. This technique is of a particular interest for bit-patterned magnetic recording medium fabrication, where close packed square magnetic bits may improve its recording performance. The process and results of generating close packed square patterns by self-limiting low-energy glow-discharge are investigated. Dense magnetic arrays formed by electrochemical deposition of nickel over self-limiting formed molds are demonstrated.
我们描述了一种低能量辉光放电过程，该过程使用反应离子刻蚀系统，可以从通过电子束光刻定义的聚甲基丙烯酸甲酯（PMMA）中的均匀圆形开口的前体阵列中形成非圆形器件图案，例如正方形或六边形。这项技术对于位图案化磁记录介质的制造特别感兴趣，其中紧密堆积的正方形磁性位可以提高其记录性能。研究了通过自限制低能量辉光放电生成紧密堆积的正方形图案的过程和结果。通过在自限制形成的模具上电化学沉积镍形成了密集的磁阵列。
