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SiC 上石墨烯膜的热力学平衡条件。

Thermodynamic equilibrium conditions of graphene films on SiC.

机构信息

Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany.

出版信息

Phys Rev Lett. 2013 Aug 9;111(6):065502. doi: 10.1103/PhysRevLett.111.065502. Epub 2013 Aug 6.

Abstract

First-principles surface phase diagrams reveal that epitaxial monolayer graphene films on the Si side of 3C-SiC(111) can exist as thermodynamically stable phases in a narrow range of experimentally controllable conditions, defining a path to the highest quality graphene films. Our calculations are based on a van der Waals corrected density functional. The full, experimentally observed (6sqrt[3]×6sqrt[3])-R30° supercells for zero- to trilayer graphene are essential to describe the correct interface geometries and the relative stability of surface phases and possible defects.

摘要

第一性原理表面相图揭示,在 3C-SiC(111)的 Si 侧外延单层石墨烯膜可以在实验可控条件的狭窄范围内作为热力学稳定相存在,为获得高质量石墨烯膜提供了途径。我们的计算基于范德华修正的密度泛函理论。对于零至三层石墨烯,完整的、实验观察到的(6sqrt[3]×6sqrt[3])-R30°超胞对于描述正确的界面几何形状以及表面相和可能的缺陷的相对稳定性至关重要。

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