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通过电介质电泳制备的近耗尽 ZnO 纳米线紫外探测器的导电性能。

Conducting properties of nearly depleted ZnO nanowire UV sensors fabricated by dielectrophoresis.

机构信息

Grupo de Electrónica y Semiconductores, Departamento de Física Aplicada, Universidad Autónoma de Madrid, E-28049 Madrid, Spain.

出版信息

Nanotechnology. 2013 Oct 18;24(41):415702. doi: 10.1088/0957-4484/24/41/415702. Epub 2013 Sep 17.

Abstract

ZnO nanowires (NWs) with different radii (rNW) have been aligned between pre-patterned electrodes using dielectrophoresis (DEP) for the fabrication of high gain UV sensors. The DEP conditions (voltage amplitude and frequency) and electrode material, geometry and size were optimized to enhance the efficiency during the DEP process. To understand the alignment mechanism of the ZnO NWs, the dielectrophoretic force (FDEP) was analyzed as a function of the DEP conditions and NW dimensions. These studies showed that the DEP alignment process tends to trap NWs with a smaller radius. The effects of NW size on device performance were analyzed by means of I-V measurements in darkness and under illumination (200 nm < λ < 600 nm). In darkness, the NW resistance increases as rNW decreases due to the reduction of the conduction volume, until saturation is reached for rNW < 65 nm. On the other hand, the NW spectral photoresponse shows high values around 10(8) A W(-1) (measured at 5 V and λ < 370 nm) and follows a linear trend as a function of the NW cross section. In addition, the cut-off wavelength depends on rNW, presenting a clear blue-shift for NWs with a lower radius (rNW < 50 nm). Transient photoresponse studies show that NWs with lower radii have longer rise times and shorter decay times mainly due to surface trapping effects. Regardless of NW size, passivation of the surface using a dielectric capping layer of SiO2 reduces the dynamic range of the photoresponse due to a strong increase of the dark current.

摘要

不同半径(rNW)的氧化锌纳米线(NWs)已通过电介质电泳(DEP)在预先图案化的电极之间对齐,用于制造高增益紫外传感器。优化了 DEP 条件(电压幅度和频率)以及电极材料、几何形状和尺寸,以提高 DEP 过程中的效率。为了理解 ZnO NWs 的对齐机制,分析了作为 DEP 条件和 NW 尺寸函数的电介质电泳力(FDEP)。这些研究表明,DEP 对齐过程倾向于捕获具有较小半径的 NWs。通过在黑暗中和光照下(200nm<λ<600nm)进行 I-V 测量来分析 NW 尺寸对器件性能的影响。在黑暗中,由于传导体积减小,NW 电阻随着 rNW 的减小而增加,直到 rNW<65nm 时达到饱和。另一方面,NW 光谱光响应在 10(8)A W(-1)左右表现出高值(在 5V 和 λ<370nm 处测量),并随 NW 横截面呈线性趋势。此外,截止波长取决于 rNW,半径较低的 NW 呈现明显的蓝移(rNW<50nm)。瞬态光响应研究表明,半径较小的 NW 具有更长的上升时间和更短的衰减时间,主要是由于表面捕获效应。无论 NW 尺寸如何,使用 SiO2 介电帽层对表面进行钝化都会由于暗电流的强烈增加而降低光响应的动态范围。

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