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通过自组装烷基膦酸盐单层的纳米切削在氧化铝表面制造分子纳米图案。

Fabrication of molecular nanopatterns at aluminium oxide surfaces by nanoshaving of self-assembled monolayers of alkylphosphonates.

机构信息

Department of Chemistry, University of Sheffield, Brook Hill, Sheffield S3 7HF, UK.

出版信息

Nanoscale. 2013 Nov 21;5(22):11125-31. doi: 10.1039/c3nr04701f. Epub 2013 Sep 26.

DOI:10.1039/c3nr04701f
PMID:24068243
Abstract

Nanoshaving, by tracing an atomic force microscope probe across a surface at elevated load, has been used to fabricate nanostructures in self-assembled monolayers of alkylphosphonates adsorbed at aluminium oxide surfaces. The simple process is implemented under ambient conditions. Because of the strong bond between the alkylphosphonates and the oxide surface, loads in excess of 400 nN are required to pattern the monolayer. Following patterning of octadecylphosphonate SAMs, adsorption of aminobutyl phosphonate yielded features as small as 39 nm. Shaving of monolayers of aryl azide-terminated alkylphosphonates, followed by attachment of polyethylene glycol to unmodified regions in a photochemical coupling reaction, yielded 102 nm trenches into which NeutrAvidin coated, dye-labelled, polymer nanospheres could be deposited, yielding bright fluorescence with little evidence of non-specific adsorption to other regions of the surface. Structures formed in alkylphosphonate films by nanoshaving were used to etch structures into the underlying metal. Because of the isotropic nature of the etch process, and the large grain size, some broadening was observed, but features 25-35 nm deep and 180 nm wide were fabricated.

摘要

原子力显微镜探针在升高的负载下划过表面进行纳米刻蚀,已被用于在氧化铝表面吸附的烷基膦酸酯自组装单层中制造纳米结构。该简单工艺在环境条件下实施。由于烷基膦酸酯与氧化物表面之间的强键,需要超过 400 nN 的负载才能对单层进行图案化。在对十八烷基膦酸酯 SAM 进行图案化后,吸附氨基丁基膦酸酯可得到小至 39 nm 的特征。对芳基叠氮端基烷基膦酸酯单层进行纳米刻蚀,然后通过光化学偶联反应将聚乙二醇附着到未修饰的区域,得到 102 nm 的沟槽,可将 NeutrAvidin 包被的、染料标记的聚合物纳米球沉积到其中,产生明亮的荧光,几乎没有证据表明对表面的其他区域有非特异性吸附。通过纳米刻蚀在烷基膦酸酯薄膜中形成的结构被用于在底层金属中刻蚀结构。由于蚀刻过程的各向同性和大晶粒尺寸,观察到一些展宽,但制造了深 25-35nm 且宽 180nm 的特征。

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