Vollnhals Florian, Woolcot Tom, Walz Marie-Madeleine, Seiler Steffen, Steinrück Hans-Peter, Thornton Geoff, Marbach Hubertus
Lehrstuhl für Physikalische Chemie II and Interdisciplinary Center for Molecular Materials (ICMM), Universität Erlangen-Nürnberg , Egerlandstraße 3, D-91058 Erlangen, Germany.
J Phys Chem C Nanomater Interfaces. 2013 Aug 29;117(34):17674-17679. doi: 10.1021/jp405640a. Epub 2013 Aug 5.
Electron beam-induced surface activation (EBISA) has been used to grow wires of iron on rutile TiO(110)-(1 × 1) in ultrahigh vacuum. The wires have a width down to ∼20 nm and hence have potential utility as interconnects on this dielectric substrate. Wire formation was achieved using an electron beam from a scanning electron microscope to activate the surface, which was subsequently exposed to Fe(CO). On the basis of scanning tunneling microscopy and Auger electron spectroscopy measurements, the activation mechanism involves electron beam-induced surface reduction and restructuring.
电子束诱导表面活化（EBISA）已被用于在超高真空中在金红石TiO(110)-(1×1)上生长铁线。这些铁线宽度低至约20纳米，因此作为这种介电基板上的互连材料具有潜在用途。通过使用扫描电子显微镜的电子束激活表面来实现铁线的形成，随后将其暴露于Fe(CO)。基于扫描隧道显微镜和俄歇电子能谱测量，活化机制涉及电子束诱导的表面还原和重构。
