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原子力显微镜纳米刻蚀图案化自组装单分子膜表面固载金属有机骨架的选择性生长

Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting.

机构信息

Institute of Functional Interfaces (IFG), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany.

出版信息

Beilstein J Nanotechnol. 2013 Oct 11;4:638-48. doi: 10.3762/bjnano.4.71. eCollection 2013.

DOI:10.3762/bjnano.4.71
PMID:24205458
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC3817682/
Abstract

Surface anchored metal-organic frameworks, SURMOFs, are highly porous materials, which can be grown on modified substrates as highly oriented, crystalline coatings by a quasi-epitaxial layer-by-layer method (liquid-phase epitaxy, or LPE). The chemical termination of the supporting substrate is crucial, because the most convenient method for substrate modification is the formation of a suitable self-assembled monolayer. The choice of a particular SAM also allows for control over the orientation of the SURMOF. Here, we demonstrate for the first time the site-selective growth of the SURMOF HKUST-1 on thiol-based self-assembled monolayers patterned by the nanografting technique, with an atomic force microscope as a structuring tool. Two different approaches were applied: The first one is based on 3-mercaptopropionic acid molecules which are grafted in a 1-decanethiolate SAM, which serves as a matrix for this nanolithography. The second approach uses 16-mercaptohexadecanoic acid, which is grafted in a matrix of an 1-octadecanethiolate SAM. In both cases a site-selective growth of the SURMOF is observed. In the latter case the roughness of the HKUST-1 is found to be significantly higher than for the 1-mercaptopropionic acid. The successful grafting process was verified by time-of-flight secondary ion mass spectrometry and atomic force microscopy. The SURMOF structures grown via LPE were investigated and characterized by atomic force microscopy and Fourier-transform infrared microscopy.

摘要

表面锚定的金属有机骨架(SURMOFs)是高度多孔的材料,可以通过准外延逐层法(液相外延或 LPE)在改性基底上生长为高度取向的结晶涂层。支撑基底的化学终止是至关重要的,因为基底改性最方便的方法是形成合适的自组装单层。特定 SAM 的选择还可以控制 SURMOF 的取向。在这里,我们首次展示了通过原子力显微镜作为结构工具,通过纳米接枝技术对基于硫醇的自组装单层进行图案化,实现 SURMOF HKUST-1 的选择性生长。我们应用了两种不同的方法:第一种方法基于 3-巯基丙酸分子,它们接枝在 1-癸硫醇盐 SAM 中,后者作为这种纳米光刻的基质。第二种方法使用 16-巯基十六烷酸,它接枝在 1-十八硫醇盐 SAM 的基质中。在这两种情况下,都观察到 SURMOF 的选择性生长。在后一种情况下,HKUST-1 的粗糙度明显高于 1-巯基丙酸。通过飞行时间二次离子质谱和原子力显微镜验证了成功的接枝过程。通过原子力显微镜和傅里叶变换红外显微镜研究和表征了通过 LPE 生长的 SURMOF 结构。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/9e01871842df/Beilstein_J_Nanotechnol-04-638-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/1ee09dd8c852/Beilstein_J_Nanotechnol-04-638-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/0b675a62437e/Beilstein_J_Nanotechnol-04-638-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/b407ec2af0bc/Beilstein_J_Nanotechnol-04-638-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/c4bffacb19b3/Beilstein_J_Nanotechnol-04-638-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/0fe0a980c912/Beilstein_J_Nanotechnol-04-638-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/944b9c3ab6d6/Beilstein_J_Nanotechnol-04-638-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/9cdb204b641a/Beilstein_J_Nanotechnol-04-638-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/4363b2e1c992/Beilstein_J_Nanotechnol-04-638-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/9e01871842df/Beilstein_J_Nanotechnol-04-638-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/1ee09dd8c852/Beilstein_J_Nanotechnol-04-638-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/0b675a62437e/Beilstein_J_Nanotechnol-04-638-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/b407ec2af0bc/Beilstein_J_Nanotechnol-04-638-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/c4bffacb19b3/Beilstein_J_Nanotechnol-04-638-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/0fe0a980c912/Beilstein_J_Nanotechnol-04-638-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/944b9c3ab6d6/Beilstein_J_Nanotechnol-04-638-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/9cdb204b641a/Beilstein_J_Nanotechnol-04-638-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/4363b2e1c992/Beilstein_J_Nanotechnol-04-638-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/63db/3817682/9e01871842df/Beilstein_J_Nanotechnol-04-638-g010.jpg

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