Suppr超能文献

使用原子力显微镜对5.25%次氯酸钠和2%氯己定对牙胶尖和热塑性聚氨酯弹性体(Resilon)根管充填尖表面质地的影响进行比较评估。

A comparative evaluation of the effect of 5.25% sodium hypochlorite and 2% chlorhexidine on the surface texture of Gutta-percha and resilon cones using atomic force microscope.

作者信息

Tilakchand Mahima, Naik Balaram, Shetty Abhijith S

机构信息

Department of Conservative Dentistry and Endodontics, S.D.M. College of Dental Sciences and Hospital, Sattur, Dharwad, Karnataka, India.

出版信息

J Conserv Dent. 2014 Jan;17(1):18-21. doi: 10.4103/0972-0707.124102.

Abstract

AIMS & OBJECTIVES: The purpose of this study was to investigate the effects of 5.25% sodium hypochlorite (NaOCl) and 2% chlorhexidine (CHX) on Gutta-percha and Resilon cones using an atomic force microscope (AFM).

MATERIALS AND METHODS

Gutta-percha cones (n = 15) and Resilon cones (n = 15) were cut 3 mm from their tip, attached to a glass slide with cyanoacrylate glue and immersed in 5.25% NaOCl and CHX for 1, 5, 10, 20 and 30 min. Five each of Gutta-percha and Resilon cones not treated with any disinfectant were used as control. The analysis of the surface topography was performed on the region between 1 and 2 mm from the tip using the AFM. The root mean square (RMS) parameters for contact mode imaging were measured. The differences between RMS values were tested by SPSS-16.0 version statistical software [IBM SPSS (Statistical Product and Service Solutions) Data Software, Chicago, US] using Kruskal-Wallis ANOVA, Mann-Whitney U-test and Wilcoxon matched pairs test.

RESULTS

There was no deterioration in the surfac e topography of Gutta-percha and Resilon when treated with 2% CHX in comparison to baseline (P < 0.05). Resilon exhibited no deterioration in topography when immersed in 5.25% NaOCl. There was a significant decrease in the mean RMS values of Gutta-percha treated with NaOCl from the control at time intervals of 1, 5, 10, 20 and 30 min.

摘要

目的

本研究旨在使用原子力显微镜(AFM)研究5.25%次氯酸钠(NaOCl)和2%氯己定(CHX)对牙胶尖和Resilon尖的影响。

材料与方法

将牙胶尖(n = 15)和Resilon尖(n = 15)从尖端切下3mm,用氰基丙烯酸酯胶粘贴在载玻片上,分别浸入5.25% NaOCl和CHX中1、5、10、20和30分钟。将未用任何消毒剂处理的5个牙胶尖和5个Resilon尖作为对照。使用AFM对距尖端1至2mm区域的表面形貌进行分析。测量接触模式成像的均方根(RMS)参数。使用SPSS-16.0版统计软件[IBM SPSS(统计产品与服务解决方案)数据软件,美国芝加哥],通过Kruskal-Wallis方差分析、Mann-Whitney U检验和Wilcoxon配对检验来检验RMS值之间的差异。

结果

与基线相比,用2% CHX处理时,牙胶尖和Resilon的表面形貌没有恶化(P < 0.05)。Resilon浸入5.25% NaOCl中时,形貌没有恶化。在1、5、10、20和30分钟的时间间隔内,用NaOCl处理的牙胶尖的平均RMS值与对照相比显著降低。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5ede/3915377/212240c0effb/JCD-17-18-g001.jpg

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验