Tsaturyan Yeghishe, Barg Andreas, Simonsen Anders, Villanueva Luis Guillermo, Schmid Silvan, Schliesser Albert, Polzik Eugene S
Opt Express. 2014 Mar 24;22(6):6810-21. doi: 10.1364/OE.22.006810.
Dielectric membranes with exceptional mechanical and optical properties present one of the most promising platforms in quantum opto-mechanics. The performance of stressed silicon nitride nanomembranes as mechanical resonators notoriously depends on how their frame is clamped to the sample mount, which in practice usually necessitates delicate, and difficult-to-reproduce mounting solutions. Here, we demonstrate that a phononic bandgap shield integrated in the membrane's silicon frame eliminates this dependence, by suppressing dissipation through phonon tunneling. We dry-etch the membrane's frame so that it assumes the form of a cm-sized bridge featuring a 1-dimensional periodic pattern, whose phononic density of states is tailored to exhibit one, or several, full band gaps around the membrane's high-Q modes in the MHz-range. We quantify the effectiveness of this phononic bandgap shield by optical interferometry measuring both the suppressed transmission of vibrations, as well as the influence of frame clamping conditions on the membrane modes. We find suppressions up to 40 dB and, for three different realized phononic structures, consistently observe significant suppression of the dependence of the membrane's modes on sample clamping-if the mode's frequency lies in the bandgap. As a result, we achieve membrane mode quality factors of 5 × 10(6) with samples that are tightly bolted to the 8 K-cold finger of a cryostat. Q × f -products of 6 × 10(12) Hz at 300 K and 14 × 10(12) Hz at 8 K are observed, satisfying one of the main requirements for optical cooling of mechanical vibrations to their quantum ground-state.
具有卓越机械和光学特性的介电膜是量子光力学中最具前景的平台之一。作为机械谐振器的应力氮化硅纳米膜的性能,众所周知取决于其框架如何固定在样品支架上,而在实际操作中,这通常需要精细且难以重现的安装解决方案。在此,我们证明集成在膜的硅框架中的声子带隙屏蔽通过抑制声子隧穿引起的耗散消除了这种依赖性。我们对膜的框架进行干法蚀刻,使其呈现为具有一维周期性图案的厘米级桥的形式,其声子态密度经过调整,以在兆赫兹范围内围绕膜的高Q模式展现一个或几个完整的带隙。我们通过光学干涉测量法来量化这种声子带隙屏蔽的有效性,该方法既能测量振动的抑制传输,又能测量框架固定条件对膜模式的影响。我们发现抑制高达40分贝,并且对于三种不同实现的声子结构,如果模式频率处于带隙中,始终能观察到膜模式对样品固定依赖性的显著抑制。结果,我们使用紧密固定在低温恒温器8K冷指上的样品实现了5×10⁶的膜模式品质因数。在300K时观察到6×10¹²赫兹的Q×f乘积,在8K时观察到14×10¹²赫兹的Q×f乘积,满足了将机械振动光学冷却到其量子基态的主要要求之一。