Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, Daejeon, 305-701, Korea.
Nanoscale. 2014 Jun 7;6(11):5953-9. doi: 10.1039/c3nr06346a. Epub 2014 Apr 25.
We describe a highly efficient method for fabricating controllable and reliable sub-20 nm scale nano-gap structures through an elastomeric nano-stamp with an embedded ultra-thin pattern. The stamp consists of ultrahigh resolution (approximately 10 nm) and high aspect ratio (ca. 15) metal nano-structures, which are obtained by secondary sputtering lithography (SSL). The nano-gap structures fabricated in this fashion achieve a high resolution and meet the requirements of minimal cost, high reliability, controllability, reproducibility, and applicability to different materials. Further, we demonstrate that this method enables the fabrication of SERS substrates for detection at the single-molecule level.
我们描述了一种通过具有嵌入式超薄图案的弹性纳米印章制造可控且可靠的亚 20nm 尺度纳米间隙结构的高效方法。该印章由超高分辨率（约 10nm）和高纵横比（约 15）的金属纳米结构组成，这些结构是通过二次溅射光刻（SSL）获得的。以这种方式制造的纳米间隙结构具有较高的分辨率，并满足低成本、高可靠性、可控性、可重复性以及适用于不同材料的要求。此外，我们证明该方法能够制造用于单分子水平检测的 SERS 基底。
