Patterson Bruce D, Beaud Paul, Braun Hans H, Dejoiea Catherine, Ingold Gerhard, Milne Christopher, Patthey Luc, Pedrini Bill, Szlachentko Jakub, Abela Rafael
SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland.
SwissFEL Paul Scherrer Institute OVGA 413 CH-5232 Villigen-PSI, Switzerland; Laboratorium für Kristallographie ETH Zürich CH-8093 Zürich, Switzerland.
Chimia (Aarau). 2014;68(1-2):73-8. doi: 10.2533/chimia.2014.73.
Next-generation X-ray sources, based on the X-ray Free Electron Laser (XFEL) concept, will provide highly coherent, ultrashort pulses of soft and hard X-rays with peak intensity many orders of magnitude higher than that of a synchrotron. These pulses will allow studies of femtosecond dynamics at nanometer resolution and with chemical selectivity. They will produce diffraction images of organic and inorganic nanostructures without deleterious effects of radiation damage.
基于X射线自由电子激光（XFEL）概念的下一代X射线源，将提供高相干、超短的软X射线和硬X射线脉冲，其峰值强度比同步加速器高出许多个数量级。这些脉冲将允许在纳米分辨率下并具有化学选择性地研究飞秒动力学。它们将产生有机和无机纳米结构的衍射图像，而不会受到辐射损伤的有害影响。
