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二硒化铼纳米片晶体管的层依赖电学和光电响应

Layer-dependent electrical and optoelectronic responses of ReSe2 nanosheet transistors.

作者信息

Yang Shengxue, Tongay Sefaattin, Li Yan, Yue Qu, Xia Jian-Bai, Li Shun-Shen, Li Jingbo, Wei Su-Huai

机构信息

State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China.

出版信息

Nanoscale. 2014 Jul 7;6(13):7226-31. doi: 10.1039/c4nr01741b.

Abstract

The ability to control the appropriate layer thickness of transition metal dichalcogenides (TMDs) affords the opportunity to engineer many properties for a variety of applications in possible technological fields. Here we demonstrate that band-gap and mobility of ReSe2 nanosheet, a new member of the TMDs, increase when the layer number decreases, thus influencing the performances of ReSe2 transistors with different layers. A single-layer ReSe2 transistor shows much higher device mobility of 9.78 cm(2) V(-1) s(-1) than few-layer transistors (0.10 cm(2) V(-1) s(-1)). Moreover, a single-layer device shows high sensitivity to red light (633 nm) and has a light-improved mobility of 14.1 cm(2) V(-1) s(-1). Molecular physisorption is used as "gating" to modulate the carrier density of our single-layer transistors, resulting in a high photoresponsivity (Rλ) of 95 A W(-1) and external quantum efficiency (EQE) of 18 645% in O2 environment. This work highlights the fact that the properties of ReSe2 can be tuned in terms of the number of layers and gas molecule gating, and single-layer ReSe2 with appropriate band-gap is a promising material for future functional device applications.

摘要

控制过渡金属二硫属化物(TMDs)合适的层厚的能力为在可能的技术领域中的各种应用设计许多特性提供了机会。在此,我们证明了作为TMDs新成员的ReSe2纳米片的带隙和迁移率会随着层数的减少而增加,从而影响不同层数的ReSe2晶体管的性能。单层ReSe2晶体管展现出比少层晶体管(0.10 cm² V⁻¹ s⁻¹)高得多的器件迁移率,达到9.78 cm² V⁻¹ s⁻¹。此外,单层器件对红光(633 nm)表现出高灵敏度,并且光致迁移率提高到14.1 cm² V⁻¹ s⁻¹。分子物理吸附被用作“门控”来调制我们单层晶体管的载流子密度,在O₂环境中产生了95 A W⁻¹的高光响应率(Rλ)和18645%的外量子效率(EQE)。这项工作突出了这样一个事实,即ReSe2的特性可以通过层数和气体分子门控来调节,并且具有合适带隙的单层ReSe2是未来功能器件应用的一种有前途的材料。

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