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V型坑对InGaN/GaN量子阱中效率 droop的影响。

Influence of V-pits on the efficiency droop in InGaN/GaN quantum wells.

作者信息

Kim Jaekyun, Cho Yong-Hee, Ko Dong-Su, Li Xiang-Shu, Won Jung-Yeon, Lee Eunha, Park Seoung-Hwan, Kim Jun-Youn, Kim Sungjin

出版信息

Opt Express. 2014 May 5;22 Suppl 3:A857-66. doi: 10.1364/OE.22.00A857.

Abstract

We discuss the influence of V-pits and their energy barrier, originating from its facets of (101¯1) planes, on the luminescence efficiency of InGaN LEDs. Experimental analysis using cathodoluminescence (CL) exhibits that thin facets of V-pits of InGaN quantum wells (QWs) appear to be effective in improving the emission intensity, preventing the injected carriers from recombining non-radiatively with threading dislocations (TDs). Our theoretical calculation based on the self-consistent approach with adopting k⋅p method reveals that higher V-pit energy barrier heights in InGaN QWs more efficiently suppress the non-radiative recombination at TDs, thus enhancing the internal quantum efficiency (IQE).

摘要

我们讨论了源自(101¯1)平面晶面的V形坑及其能垒对InGaN发光二极管发光效率的影响。利用阴极发光(CL)进行的实验分析表明,InGaN量子阱(QWs)中V形坑的薄晶面似乎在提高发射强度方面是有效的,可防止注入的载流子与穿透位错(TDs)发生非辐射复合。我们基于采用k⋅p方法的自洽方法进行的理论计算表明,InGaN量子阱中较高的V形坑能垒高度更有效地抑制了TDs处的非辐射复合,从而提高了内量子效率(IQE)。

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