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纳米级V形凹坑对氮化镓基发光二极管的影响。

Effects of Nanoscale V-Shaped Pits on GaN-Based Light Emitting Diodes.

作者信息

Chen Shuo-Wei, Li Heng, Chang Chia-Jui, Lu Tien-Chang

机构信息

Department of Photonics, National Chiao Tung University, Hsinchu 300, Taiwan.

Epistar Corporation, Hsinchu 300, Taiwan.

出版信息

Materials (Basel). 2017 Jan 28;10(2):113. doi: 10.3390/ma10020113.

Abstract

This paper reviews the formation of nanoscale V-shaped pits on GaN-based light emitting diodes (LEDs) grown by the metal organic chemical vapor deposition (MOCVD) system and studies the effect of V-shaped pits on quantum efficiency. Since V-pits could provide potential barriers around threading dislocations to lessen non-radiative recombinations in such a high defect environment. In our study, multiple InGaN/GaN quantum well samples with different emission wavelengths of 380, 420, 460, and 500 nm were grown, each with different nanoscale V-shaped pits of three diameters for 150, 200, and 250 nm, respectively. It was found that the multiple quantum well (MQW) sample with larger V-pits had a lower pit density, but a relatively larger total V-pits defected area. The optimum diameter of V-pits showing the highest quantum efficiency from the MQW sample depended on the emission wavelength. MQW samples with wavelengths of 380 and 500 nm exhibited the best internal quantum efficiency (IQE) performance at the smallest V-pits area; however, the best performance for MQW samples with wavelength around 420 and 460 nm occurred when large V-pit areas were presented. Photoluminescence (PL) peak shifts and Raman shifts can provide a relationship between quantum-confined Stark effect (QCSE) and IQE, as well as a comparison between strain and IQE. The results obtained in this phenomenological study shall provide a useful guide line in making high-performance GaN-based LEDs with wide emission spectra.

摘要

本文综述了通过金属有机化学气相沉积(MOCVD)系统生长的氮化镓基发光二极管(LED)上纳米级V形坑的形成,并研究了V形坑对量子效率的影响。因为在如此高缺陷的环境中,V形坑可以在穿透位错周围提供势垒,以减少非辐射复合。在我们的研究中,生长了多个发射波长分别为380、420、460和500nm的氮化铟镓/氮化镓多量子阱样品,每个样品分别具有三种直径为150、200和250nm的不同纳米级V形坑。结果发现,具有较大V形坑的多量子阱(MQW)样品具有较低的坑密度,但总的V形坑缺陷面积相对较大。从MQW样品中显示出最高量子效率的V形坑的最佳直径取决于发射波长。波长为380和500nm的MQW样品在最小的V形坑面积下表现出最佳的内量子效率(IQE)性能;然而,波长约为420和460nm的MQW样品在具有较大V形坑面积时表现出最佳性能。光致发光(PL)峰位移和拉曼位移可以提供量子限制斯塔克效应(QCSE)与IQE之间的关系,以及应变与IQE之间的比较。在这项唯象学研究中获得的结果将为制造具有宽发射光谱的高性能氮化镓基LED提供有用的指导。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1269/5459134/5a86d3aa00d7/materials-10-00113-g001.jpg

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