Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Colaba, Mumbai - 400 005, India.
Nanomaterials Research Lab, Surface Engineering Division, CSIR-National Aerospace Laboratories, Bangalore-560 017, India.
Sci Rep. 2014 Jun 17;4:5328. doi: 10.1038/srep05328.
We observed interfacial chemical sharpening due to uphill diffusion in post annealed ultrathin multilayer stack of Co and Pt, which leads to enhanced interfacial perpendicular magnetic anisotropy (PMA). This is surprising as these elements are considered as perfectly miscible. This chemical sharpening was confirmed through quantitative energy dispersive x-ray (EDX) spectroscopy and intensity distribution of images taken on high angle annular dark field (HAADF) detector in Scanning Transmission Electron Microscopic (STEM) mode. This observation demonstrates an evidence of miscibility gap in ultrathin coherent Co/Pt multilayer stacks.
我们观察到在退火后的超薄膜层 Co 和 Pt 的多层堆叠中，由于上坡扩散导致界面化学变陡，从而增强了界面垂直磁各向异性（PMA）。这令人惊讶，因为这些元素被认为是完全可混溶的。这种化学变陡通过定量能量色散 X 射线（EDX）光谱和在扫描透射电子显微镜（STEM）模式下高角度环形暗场（HAADF）探测器上拍摄的图像的强度分布得到证实。这一观察结果证明了超薄膜层 Co/Pt 多层堆叠中存在混溶性间隙。
