Qadri Muhammad U, Diaz Alex Fabian Diaz, Cittadini Michaela, Martucci Alessandro, Pujol Maria Cinta, Ferré-Borrull Josep, Llobet Eduard, Aguiló Magdalena, Díaz Francesc
Cristal·lografía de Materials i Nanomaterials (FiCMA-FiCNA)-EMaS, Universitat Rovira i Virgili, (URV), Campus Sescelades, c/Marcel·í Domingo s/n, Tarragona 43007, Spain.
Dipartimento di Ingegneria Industriale,Universita' di Padova,Via Marzolo 9, Padova 35131, Italy.
Sensors (Basel). 2014 Jun 27;14(7):11427-43. doi: 10.3390/s140711427.
Thin films of tungsten trioxide were deposited on quartz substrates by RF magnetron sputtering. Different annealing temperatures in the range from 423 to 973 K were used under ambient atmosphere. The influence of the annealing temperature on the structure and optical properties of the resulting WO3 thin films were studied. The surface morphology of the films is composed of grains with an average size near 70 nm for the films annealed between 773 and 973 K. Some of the WO3 thin films were also coated with Pt nanoparticles of about 45 nm in size. Spectrometric measurements of transmittance were carried out for both types of WO3 samples in the wavelength range from 200-900 nm, to determine the effect of the exposure to two different gases namely H2 and CO. Films showed fast response and recovery times, in the range of few seconds. The addition of Pt nanoparticles enables reducing the operation temperature to room temperature.
通过射频磁控溅射在石英衬底上沉积三氧化钨薄膜。在环境气氛下使用423至973 K范围内的不同退火温度。研究了退火温度对所得三氧化钨薄膜结构和光学性能的影响。对于在773至973 K之间退火处理的薄膜，其表面形态由平均尺寸接近70 nm的晶粒组成。部分三氧化钨薄膜还涂覆了尺寸约为45 nm的铂纳米颗粒。对两种类型的三氧化钨样品在200 - 900 nm波长范围内进行了透过率光谱测量，以确定暴露于两种不同气体（即氢气和一氧化碳）的影响。薄膜显示出快速的响应和恢复时间，在几秒范围内。铂纳米颗粒的添加能够将工作温度降低至室温。
