Manciu Felicia S, Manciu Marian, Durrer William G, Salazar Jessica G, Lee Kendall H, Bennet Kevin E
Department of Physics, University of Texas at El Paso, El Paso, TX 79968, USA.
Department of Neurosurgery, Mayo Clinic, Rochester, MN 55905, USA.
J Mater Sci. 2014 Aug 1;49(16):5782-5789. doi: 10.1007/s10853-014-8309-x.
Boron-doped diamond (BDD) has seen a substantial increase in interest for use as electrode coating material for electrochemistry and studies of deep brain stimulation mechanism. In this study, we present an alternative method for determining important characteristics, including conductivity, carrier concentration, and time constant, of such material by the signature of Drude-like metallic behavior in the far-infrared (IR) spectral range. Unlike the direct determination of conductivity from the four-point probe method, using far-IR transmittance provides additional information, such as whether the incorporation of boron results in a large concentration of carriers or in inducing defects in the diamond lattice. The slightly doped to medium-doped BDD samples that were produced using chemical vapor deposition and analyzed in this work show conductivities ranging between 5.5 and 11 (Ω cm). Different growth conditions demonstrate that increasing boron concentration results in an increase in the carrier concentration, with values between 7.2 × 10 and 2.5 × 10 carriers/cm. Addition of boron, besides leading to a decrease in the resistivity, also resulted in a decrease in the time constant, limiting BDD conductivity. Investigations, by confocal Raman mapping, of the induced stress in the material due to interaction with the substrate or to the amount of doping are also presented and discussed. The induced tensile stress, which was distributed closer to the film-substrate interface decreased slightly with doping.
掺硼金刚石(BDD)作为用于电化学和深部脑刺激机制研究的电极涂层材料,其关注度大幅提高。在本研究中,我们提出了一种替代方法,通过远红外(IR)光谱范围内类似德鲁德金属行为的特征来确定此类材料的重要特性,包括电导率、载流子浓度和时间常数。与通过四点探针法直接测定电导率不同,使用远红外透射率可提供额外信息,例如硼的掺入是导致大量载流子还是在金刚石晶格中诱导缺陷。在本工作中使用化学气相沉积法制备并分析的轻度掺杂到中度掺杂的BDD样品,其电导率在5.5至11(Ω·cm)之间。不同的生长条件表明,硼浓度的增加会导致载流子浓度增加,其值在7.2×10至2.5×10载流子/cm之间。硼的添加除了导致电阻率降低外,还导致时间常数减小,限制了BDD的电导率。还通过共焦拉曼映射对材料因与衬底相互作用或掺杂量而产生的诱导应力进行了研究和讨论。靠近膜 - 衬底界面分布的诱导拉伸应力随掺杂略有降低。