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质子插层的二维WO₃纳米薄片在室温下具有增强的载流子迁移率。

Proton intercalated two-dimensional WO3 nano-flakes with enhanced charge-carrier mobility at room temperature.

作者信息

Zhuiykov Serge, Kats Eugene, Carey Benjamin, Balendhran Sivacarendran

机构信息

CSIRO, Materials Science and Engineering Division, 37 Graham Road, Highett, VIC 3190, Australia.

出版信息

Nanoscale. 2014 Dec 21;6(24):15029-36. doi: 10.1039/c4nr05008h. Epub 2014 Nov 4.

Abstract

Quasi two-dimensional (Q2D) semiconducting metal oxides with enhanced charge carrier mobility hold tremendous promise for nano-electronics, photonics, catalysis, nano-sensors and electrochromic applications. In addition to graphene and metal dichalcogenides MX2 (M = Mo, W; X = S, Se, Te), 2D sub-stoichiometric WO(3-x) is gaining importance as a promising semiconductor material for field-effect-transistor (FET) based devices. A combination of high permittivity, suppression of the Coulomb effects, and their stratified structure enhances the carrier mobility in such a material. Additionally, the sub-stoichiometry of this semiconductor oxide allows the reduction of the bandgap and increase of the free charge carriers at the same time. Here, we report for the first time H(+) intercalated WO(3) FETs, made of Q2D nano-flakes, with enhanced charge-carrier mobility exceeding 319 cm(2) V(-1) s(-1) comparable with the charge-carrier mobility of Q2D dichalcogenides MoS(2) and WSe(2). Analyses indicate that the enhanced electrical properties of the sub-stoichiometric WO(3-x) depend on the oxygen vacancies in the intercalated nano-flakes. These findings confirmed that Q2D sub-stoichiometric WO(3-x) is a promising material for various functional FET devices.

摘要

具有增强电荷载流子迁移率的准二维(Q2D)半导体金属氧化物在纳米电子学、光子学、催化、纳米传感器和电致变色应用方面具有巨大潜力。除了石墨烯和金属二卤化物MX2(M = Mo、W;X = S、Se、Te)之外,二维亚化学计量比的WO(3-x)作为一种有前途的基于场效应晶体管(FET)的半导体材料正变得越来越重要。高介电常数、库仑效应的抑制以及它们的分层结构的结合增强了这种材料中的载流子迁移率。此外,这种半导体氧化物的亚化学计量比允许同时减小带隙并增加自由电荷载流子。在此,我们首次报道了由Q2D纳米薄片制成的H(+)嵌入的WO(3) FET,其电荷载流子迁移率增强超过319 cm(2) V(-1) s(-1),与Q2D二卤化物MoS(2)和WSe(2)的电荷载流子迁移率相当。分析表明,亚化学计量比的WO(3-x)增强的电学性能取决于嵌入纳米薄片中的氧空位。这些发现证实了Q2D亚化学计量比的WO(3-x)是用于各种功能性FET器件的有前途的材料。

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