Xie Xianzong, Rieth Loren, Caldwell Ryan, Negi Sandeep, Bhandari Rajmohan, Sharma Rohit, Tathireddy Prashant, Solzbacher Florian
University of Utah, Salt Lake City, UT, USA,
Biomed Microdevices. 2015 Feb;17(1):1. doi: 10.1007/s10544-014-9904-y.
The lifetime of neural interfaces is a critical challenge for chronic implantations, as therapeutic devices (e.g., neural prosthetics) will require decades of lifetime. We evaluated the lifetime of wireless Utah electrode array (UEA) based neural interfaces with a bilayer encapsulation scheme utilizing a combination of alumina deposited by Atomic Layer Deposition (ALD) and parylene C. Wireless integrated neural interfaces (INIs), equipped with recording version 9 (INI-R9) ASIC chips, were used to monitor the encapsulation performance through radio-frequency (RF) power and telemetry. The wireless devices were encapsulated with 52 nm of ALD Al2O3 and 6 μm of parylene C, and tested by soaking in phosphate buffered solution (PBS) at 57 °C for 4× accelerated lifetime testing. The INIs were also powered continuously through 2.765 MHz inductive power and forward telemetry link at unregulated 5 V. The bilayer encapsulated INIs were fully functional for ∼35 days (140 days at 37 °C equivalent) with consistent power-up frequencies (∼910 MHz), stable RF signal (∼-75 dBm), and 100 % command reception rate. This is ∼10 times of equivalent lifetime of INIs with parylene-only encapsulation (13 days) under same power condition at 37 °C. The bilayer coated INIs without continuous powering lasted over 1860 equivalent days (still working) at 37 °C. Those results suggest that bias stress is a significant factor to accelerate the failure of the encapsulated devices. The INIs failed completely within 5 days of the initial frequency shift of RF signal at 57 °C, which implied that the RF frequency shift is an early indicator of encapsulation/device failure.
对于长期植入而言,神经接口的使用寿命是一项严峻挑战,因为治疗设备(如神经假体)需要长达数十年的使用寿命。我们采用了一种双层封装方案来评估基于无线犹他电极阵列(UEA)的神经接口的使用寿命,该方案结合了通过原子层沉积(ALD)法沉积的氧化铝和聚对二甲苯C。配备记录版本9(INI-R9)专用集成电路芯片的无线集成神经接口(INI),被用于通过射频(RF)功率和遥测来监测封装性能。这些无线设备用52纳米的ALD Al2O3和6微米的聚对二甲苯C进行封装,并通过在57°C的磷酸盐缓冲溶液(PBS)中浸泡进行4倍加速寿命测试。这些INI还通过2.765兆赫兹的感应功率和未稳压5伏的正向遥测链路持续供电。双层封装的INI在约35天(相当于37°C下的140天)内功能完全正常,具有一致的上电频率(约910兆赫兹)、稳定的射频信号(约-75分贝毫瓦)和100%的指令接收率。这大约是在37°C相同功率条件下仅用聚对二甲苯封装的INI等效寿命(13天)的10倍。未持续供电的双层涂层INI在37°C下持续了超过1860个等效天数(仍在工作)。这些结果表明,偏置应力是加速封装设备失效的一个重要因素。在57°C时,INI在射频信号初始频移后的5天内完全失效,这意味着射频频移是封装/设备失效的早期指标。