Suppr超能文献

偏置电压和温度对采用Al₂O₃和聚对二甲苯双层封装的无线神经接口寿命的影响。

Effect of bias voltage and temperature on lifetime of wireless neural interfaces with Al ₂O₃ and parylene bilayer encapsulation.

作者信息

Xie Xianzong, Rieth Loren, Caldwell Ryan, Negi Sandeep, Bhandari Rajmohan, Sharma Rohit, Tathireddy Prashant, Solzbacher Florian

机构信息

University of Utah, Salt Lake City, UT, USA,

出版信息

Biomed Microdevices. 2015 Feb;17(1):1. doi: 10.1007/s10544-014-9904-y.

Abstract

The lifetime of neural interfaces is a critical challenge for chronic implantations, as therapeutic devices (e.g., neural prosthetics) will require decades of lifetime. We evaluated the lifetime of wireless Utah electrode array (UEA) based neural interfaces with a bilayer encapsulation scheme utilizing a combination of alumina deposited by Atomic Layer Deposition (ALD) and parylene C. Wireless integrated neural interfaces (INIs), equipped with recording version 9 (INI-R9) ASIC chips, were used to monitor the encapsulation performance through radio-frequency (RF) power and telemetry. The wireless devices were encapsulated with 52 nm of ALD Al2O3 and 6 μm of parylene C, and tested by soaking in phosphate buffered solution (PBS) at 57 °C for 4× accelerated lifetime testing. The INIs were also powered continuously through 2.765 MHz inductive power and forward telemetry link at unregulated 5 V. The bilayer encapsulated INIs were fully functional for ∼35 days (140 days at 37 °C equivalent) with consistent power-up frequencies (∼910 MHz), stable RF signal (∼-75 dBm), and 100 % command reception rate. This is ∼10 times of equivalent lifetime of INIs with parylene-only encapsulation (13 days) under same power condition at 37 °C. The bilayer coated INIs without continuous powering lasted over 1860 equivalent days (still working) at 37 °C. Those results suggest that bias stress is a significant factor to accelerate the failure of the encapsulated devices. The INIs failed completely within 5 days of the initial frequency shift of RF signal at 57 °C, which implied that the RF frequency shift is an early indicator of encapsulation/device failure.

摘要

对于长期植入而言,神经接口的使用寿命是一项严峻挑战,因为治疗设备(如神经假体)需要长达数十年的使用寿命。我们采用了一种双层封装方案来评估基于无线犹他电极阵列(UEA)的神经接口的使用寿命,该方案结合了通过原子层沉积(ALD)法沉积的氧化铝和聚对二甲苯C。配备记录版本9(INI-R9)专用集成电路芯片的无线集成神经接口(INI),被用于通过射频(RF)功率和遥测来监测封装性能。这些无线设备用52纳米的ALD Al2O3和6微米的聚对二甲苯C进行封装,并通过在57°C的磷酸盐缓冲溶液(PBS)中浸泡进行4倍加速寿命测试。这些INI还通过2.765兆赫兹的感应功率和未稳压5伏的正向遥测链路持续供电。双层封装的INI在约35天(相当于37°C下的140天)内功能完全正常,具有一致的上电频率(约910兆赫兹)、稳定的射频信号(约-75分贝毫瓦)和100%的指令接收率。这大约是在37°C相同功率条件下仅用聚对二甲苯封装的INI等效寿命(13天)的10倍。未持续供电的双层涂层INI在37°C下持续了超过1860个等效天数(仍在工作)。这些结果表明,偏置应力是加速封装设备失效的一个重要因素。在57°C时,INI在射频信号初始频移后的5天内完全失效,这意味着射频频移是封装/设备失效的早期指标。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验