Martin Aiden A, Randolph Steven, Botman Aurelien, Toth Milos, Aharonovich Igor
School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
FEI Company, 5350 Northeast Dawson Creek Drive, Hillsboro, Oregon 97214-5793, USA.
Sci Rep. 2015 Mar 10;5:8958. doi: 10.1038/srep08958.
Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching.
聚焦离子束技术的最新进展使得使用轻离子进行高分辨率、无掩膜纳米加工成为可能。然而，迄今为止，对轻离子的研究主要集中在材料的铣削上，其中亚表面离子束损伤不会影响器件性能。在此，我们报告了使用聚焦氧离子束对单晶金刚石进行无掩膜铣削的情况。通过拉曼光谱和发光分析对材料质量进行了评估，结果表明，由氧离子产生的损伤层可以通过局部电子束诱导化学蚀刻等非侵入性后处理方法去除。
