Nishikawa Yumiko, Takahashi Tsutomu, Takayanagi Yoichiro, Furuichi Atsushi, Kido Mikio, Nakamura Mihoko, Sasabayashi Daiki, Noguchi Kyo, Suzuki Michio
Department of Neuropsychiatry, University of Toyama Graduate School of Medicine and Pharmaceutical Sciences, 2630 Sugitani, Toyama, 930-0194, Japan.
Department of Radiology, University of Toyama Graduate School of Medicine and Pharmaceutical Sciences, 2630 Sugitani, Toyama, 930-0194, Japan.
Eur Arch Psychiatry Clin Neurosci. 2016 Feb;266(1):15-23. doi: 10.1007/s00406-015-0587-z. Epub 2015 Mar 11.
Morphological changes in the orbitofrontal cortex (OFC), such as an altered sulcogyral pattern of the 'H-shaped' orbital sulcus and a shallow olfactory sulcus, have been demonstrated in schizophrenia, possibly reflecting deviations in early neurodevelopment. However, it remains unclear whether patients with schizotypal features exhibit similar OFC changes. This magnetic resonance imaging study examined the OFC sulcogyral pattern (Types I, II, III, and IV) and olfactory sulcus morphology in 102 patients with schizophrenia, 47 patients with schizotypal disorder, and 84 healthy controls. The OFC sulcogyral pattern distribution between the groups was significantly different on the right hemisphere, with the schizophrenia patients showing a decrease in Type I (vs controls and schizotypal patients) and an increase in Type III (vs controls) expression. However, the schizotypal patients and controls did not differ in the OFC pattern. There were significant group differences in the olfactory sulcus depth bilaterally (schizophrenia patients < schizotypal patients < controls). Our findings suggest that schizotypal disorder, a milder form of schizophrenia spectrum disorders, partly shares the OFC changes (i.e., altered depth of the olfactory sulcus) with schizophrenia, possibly reflecting a common disease vulnerability. However, altered distribution of the OFC pattern specific to schizophrenia may at least partly reflect neurodevelopmental pathology related to a greater susceptibility to overt psychosis.
在精神分裂症患者中已证实眶额皮质（OFC）存在形态学变化，例如“H形”眶沟的脑沟回模式改变以及嗅沟变浅，这可能反映了早期神经发育的偏差。然而，具有分裂型特征的患者是否表现出类似的OFC变化仍不清楚。这项磁共振成像研究检查了102例精神分裂症患者、47例分裂型障碍患者和84名健康对照者的OFC脑沟回模式（I型、II型、III型和IV型）和嗅沟形态。各组之间的OFC脑沟回模式分布在右半球有显著差异，精神分裂症患者I型表达减少（与对照者和分裂型患者相比），III型表达增加（与对照者相比）。然而，分裂型患者和对照者在OFC模式上没有差异。双侧嗅沟深度存在显著的组间差异（精神分裂症患者<分裂型患者<对照者）。我们的研究结果表明，分裂型障碍作为精神分裂症谱系障碍的一种较轻形式，部分与精神分裂症共享OFC变化（即嗅沟深度改变），这可能反映了共同的疾病易感性。然而，精神分裂症特有的OFC模式分布改变可能至少部分反映了与明显精神病易感性增加相关的神经发育病理学。
