§Laboratoire National des Champs Magnétiques Intenses (LCNMI), CNRS, 25 rue des Martyrs B.P. 166, 38042 Grenoble, France.
Nano Lett. 2015 Apr 8;15(4):2336-42. doi: 10.1021/nl5045007. Epub 2015 Mar 27.
We study the evolution of the band gap structure in few-layer MoTe2 crystals, by means of low-temperature microreflectance (MR) and temperature-dependent photoluminescence (PL) measurements. The analysis of the measurements indicate that in complete analogy with other semiconducting transition metal dichalchogenides (TMDs) the dominant PL emission peaks originate from direct transitions associated with recombination of excitons and trions. When we follow the evolution of the PL intensity as a function of layer thickness, however, we observe that MoTe2 behaves differently from other semiconducting TMDs investigated earlier. Specifically, the exciton PL yield (integrated PL intensity) is identical for mono and bilayer, decreases slightly for trilayer, and it is significantly lower in the tetralayer. The analysis of this behavior and of all our experimental observations is fully consistent with mono and bilayer MoTe2 being direct band gap semiconductors with tetralayer MoTe2 being an indirect gap semiconductor and with trilayers having nearly identical direct and indirect gaps. This conclusion is different from the one reached for other recently investigated semiconducting transition metal dichalcogenides for which monolayers are found to be direct band gap semiconductors, and thicker layers have indirect band gaps that are significantly smaller (by hundreds of meV) than the direct gap. We discuss the relevance of our findings for experiments of fundamental interest and possible future device applications.
我们通过低温微反射率(MR)和温度依赖光致发光(PL)测量研究了少层 MoTe2 晶体的能带隙结构演化。测量分析表明,与其他半导体过渡金属二卤代物(TMDs)完全类似,主要的 PL 发射峰源自与激子和三激子复合相关的直接跃迁。然而,当我们跟踪 PL 强度随层厚的演化时,我们观察到 MoTe2 的行为与之前研究过的其他半导体 TMDs 不同。具体而言,对于单层和双层 MoTe2,激子 PL 产率(积分 PL 强度)相同,对于三层 MoTe2 略有下降,而对于四层 MoTe2 则显著降低。这种行为的分析以及我们所有的实验观察结果都与以下结论完全一致,即单层和双层 MoTe2 是直接带隙半导体,而四层 MoTe2 是间接带隙半导体,并且三层 MoTe2 具有几乎相同的直接和间接带隙。与最近研究的其他半导体过渡金属二卤代物不同,我们的结论是对于这些半导体二卤代物,单层 MoTe2 被发现是直接带隙半导体,而较厚的层具有较小的间接带隙(数百毫伏特),比直接带隙小得多。我们讨论了我们的发现对基础研究实验和可能的未来器件应用的意义。