Baker A A, Braun W, Gassler G, Rembold S, Fischer A, Hesjedal T
Clarendon Laboratory, Department of Physics, University of Oxford, Oxford OX1 3PU, United Kingdom.
CreaTec Fischer & Co. GmbH, Industriestr. 9, 74391 Erligheim, Germany.
Rev Sci Instrum. 2015 Apr;86(4):043901. doi: 10.1063/1.4917009.
We present a miniaturized molecular beam epitaxy (miniMBE) system with an outer diameter of 206 mm, optimized for flexible and high-throughput operation. The three-chamber system, used here for oxide growth, consists of a sample loading chamber, a storage chamber, and a growth chamber. The growth chamber is equipped with eight identical effusion cell ports with linear shutters, one larger port for either a multi-pocket electron beam evaporator or an oxygen plasma source, an integrated cryoshroud, retractable beam-flux monitor or quartz-crystal microbalance, reflection high energy electron diffraction, substrate manipulator, main shutter, and quadrupole mass spectrometer. The system can be combined with ultrahigh vacuum (UHV) end stations on synchrotron and neutron beamlines, or equivalently with other complex surface analysis systems, including low-temperature scanning probe microscopy systems. Substrate handling is compatible with most UHV surface characterization systems, as the miniMBE can accommodate standard surface science sample holders. We introduce the design of the system, and its specific capabilities and operational parameters, and we demonstrate the epitaxial thin film growth of magnetoelectric Cr2O3 on c-plane sapphire and ferrimagnetic Fe3O4 on MgO (001).
我们展示了一种外径为206毫米的小型分子束外延（miniMBE）系统，该系统针对灵活且高通量的操作进行了优化。此处用于氧化物生长的三室系统由样品加载室、储存室和生长室组成。生长室配备有八个带线性快门的相同喷射单元端口、一个用于多腔电子束蒸发器或氧等离子体源的较大端口、一个集成低温护罩、可伸缩束流监测器或石英晶体微天平、反射高能电子衍射仪、衬底操纵器、主快门和四极质谱仪。该系统可与同步加速器和中子束线的超高真空（UHV）终端站相结合，或者等效地与其他复杂表面分析系统相结合，包括低温扫描探针显微镜系统。由于miniMBE可以容纳标准表面科学样品架，因此衬底处理与大多数UHV表面表征系统兼容。我们介绍了该系统的设计、其特定功能和操作参数，并展示了在c面蓝宝石上外延生长磁电Cr2O3以及在MgO（001）上外延生长亚铁磁性Fe3O4。
