†Fraunhofer Institute for Applied Solid State Physics, Tullastraße 72, 79108 Freiburg, Germany.
‡Department of Microsystems Engineering - IMTEK, University of Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg, Germany.
Langmuir. 2015 May 19;31(19):5319-25. doi: 10.1021/acs.langmuir.5b01060. Epub 2015 May 8.
Monosized (∼4 nm) diamond nanoparticles arranged on substrate surfaces are exciting candidates for single-photon sources and nucleation sites for ultrathin nanocrystalline diamond film growth. The most commonly used technique to obtain substrate-supported diamond nanoparticles is electrostatic self-assembly seeding using nanodiamond colloidal suspensions. Currently, monodisperse nanodiamond colloids, which have a narrow distribution of particle sizes centering on the core particle size (∼4 nm), are available for the seeding technique on different substrate materials such as Si, SiO2, Cu, and AlN. However, the self-assembled nanoparticles tend to form small (typically a few tens of nanometers or even larger) aggregates on all of those substrate materials. In this study, this major weakness of self-assembled diamond nanoparticles was solved by modifying the salt concentration of nanodiamond colloidal suspensions. Several salt concentrations of colloidal suspensions were prepared using potassium chloride as an inserted electrolyte and were examined with respect to seeding on SiO2 surfaces. The colloidal suspensions and the seeded surfaces were characterized by dynamic light scattering and atomic force microscopy, respectively. Also, the interaction energies between diamond nanoparticles in each of the examined colloidal suspensions were compared on the basis of the Derjaguin-Landau-Verwey-Overbeek (DLVO) theory. From these investigations, it became clear that the appropriate salt concentration suppresses the formation of small aggregates during the seeding process owing to the modified electrostatic repulsive interaction between nanoparticles. Finally, monosized (<10 nm) individual diamond nanoparticles arranged on SiO2 surfaces have been successfully obtained.
在衬底表面排列的单分散(约 4nm)金刚石纳米颗粒是单光子源和超薄纳米晶金刚石薄膜生长的成核位点的理想候选材料。获得衬底支撑金刚石纳米颗粒的最常用技术是使用纳米金刚石胶体悬浮液进行静电自组装播种。目前,具有约 4nm 核心粒径的单分散纳米金刚石胶体可用于在不同衬底材料(如 Si、SiO2、Cu 和 AlN)上进行播种技术。然而,自组装纳米颗粒往往会在所有这些衬底材料上形成小的(通常为数十分米甚至更大)聚集体。在这项研究中,通过改变纳米金刚石胶体悬浮液的盐浓度来解决自组装金刚石纳米颗粒的这一主要弱点。使用氯化钾作为插入电解质制备了几种胶体悬浮液的盐浓度,并对其在 SiO2 表面上的播种进行了研究。分别使用动态光散射和原子力显微镜对胶体悬浮液和播种表面进行了表征。此外,还基于德加古因-兰德劳-弗韦尔贝克(DLVO)理论比较了在每种胶体悬浮液中金刚石纳米颗粒之间的相互作用能。通过这些研究,清楚地表明,适当的盐浓度可以抑制播种过程中小聚集体的形成,这是由于纳米颗粒之间的静电排斥相互作用得到了修饰。最后,成功地在 SiO2 表面上获得了排列整齐的单分散(<10nm)金刚石纳米颗粒。