Hwang Sooyeon, Lee Ju Ho, Kim Young Yi, Yun Myeong Goo, Lee Kwan-Hun, Lee Jeong Yong, Cho Hyung Koun
J Nanosci Nanotechnol. 2014 Dec;14(12):8908-14. doi: 10.1166/jnn.2014.10055.
While tin oxides such as SnO and SnO2 are widely used in various applications, surprisingly, only a limited number of reports have been presented on the microstructural characteristics of tin oxide thin films grown under various growth conditions. In this paper, the effects of the substrate temperature and content of foreign Zn ion on the microstructural characteristics of tin oxide thin films grown by radio-frequency magnetron sputtering were investigated. The increase in substrate temperature induced change in the stoichiometry of the thin films from SnO(1+x) to SnO(2-x). Additionally, the phase contrast in the transmission electron microscopy image revealed that SnO(1+x) and SnO(2-x) phases were alternating in thin films and the width of each phase became narrower at high substrate temperature. The ternary zinc tin oxide thin films were deposited using the co-sputtering method. As the ZnO target power increased, the crystallinity of the thin films became poly-crystalline, and then showed improved crystallinity again with two types of phases.
虽然氧化锡（如SnO和SnO₂）在各种应用中被广泛使用，但令人惊讶的是，关于在各种生长条件下生长的氧化锡薄膜的微观结构特征的报道却非常有限。本文研究了衬底温度和外来锌离子含量对通过射频磁控溅射生长的氧化锡薄膜微观结构特征的影响。衬底温度的升高导致薄膜的化学计量从SnO(1 + x)变为SnO(2 - x)。此外，透射电子显微镜图像中的相衬显示，SnO(1 + x)和SnO(2 - x)相在薄膜中交替出现，并且在高衬底温度下每个相的宽度变窄。采用共溅射法沉积三元锌锡氧化物薄膜。随着ZnO靶功率的增加，薄膜的结晶度变为多晶，然后又出现两种相且结晶度得到改善。
