Noriki Takahiro, Abe Shogo, Kajikawa Kotaro, Shimojo Masayuki
Department of Materials Science and Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo, 135-8548, Japan.
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, 226-8502, Japan.
Beilstein J Nanotechnol. 2015 Apr 22;6:1010-5. doi: 10.3762/bjnano.6.104. eCollection 2015.
We propose a novel patterning technique for gold nanoparticles on substrates that combines a chemical reaction with electron beam irradiation. First, gold nanoparticles are placed in a two-dimensional arrangement on the substrate. Then, particular nanoparticles are fixed on the substrate by irradiation with a focused electron beam to produce a desired pattern. Finally, the unfixed nanoparticles are removed. Using this technique, an array of gold nanoparticles, for example, in the form of a line or patterned over an area, are prepared on the substrate. This technique could contribute to the fabrication of plasmonic devices and other applications that require the controlled placement of gold nanoparticles on substrates.
我们提出了一种用于在基底上制备金纳米颗粒的新型图案化技术，该技术将化学反应与电子束辐照相结合。首先，将金纳米颗粒以二维排列放置在基底上。然后，通过聚焦电子束辐照将特定的纳米颗粒固定在基底上，以产生所需的图案。最后，去除未固定的纳米颗粒。使用这种技术，可以在基底上制备例如呈线状或在一定区域上图案化的金纳米颗粒阵列。该技术有助于制造等离子体器件以及其他需要在基底上可控放置金纳米颗粒的应用。
