Suppr超能文献

在层状 MoS2 中的价带分裂。

On Valence-Band Splitting in Layered MoS2.

机构信息

State Key Laboratory of ASIC & System, School of Information Science and Technology, Fudan University , Shanghai 200433, China.

State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences , Changning Road 865, Shanghai 200050, China.

出版信息

ACS Nano. 2015 Aug 25;9(8):8514-9. doi: 10.1021/acsnano.5b03505. Epub 2015 Aug 4.

Abstract

As a representative two-dimensional semiconducting transition-metal dichalcogenide (TMD), the electronic structure in layered MoS2 is a collective result of quantum confinement, interlayer interaction, and crystal symmetry. A prominent energy splitting in the valence band gives rise to many intriguing electronic, optical, and magnetic phenomena. Despite numerous studies, an experimental determination of valence-band splitting in few-layer MoS2 is still lacking. Here, we show how the valence-band maximum (VBM) splits for one to five layers of MoS2. Interlayer coupling is found to contribute significantly to phonon energy but weakly to VBM splitting in bilayers, due to a small interlayer hopping energy for holes. Hence, spin-orbit coupling is still predominant in the splitting. A temperature-independent VBM splitting, known for single-layer MoS2, is, thus, observed for bilayers. However, a Bose-Einstein type of temperature dependence of VBM splitting prevails in three to five layers of MoS2. In such few-layer MoS2, interlayer coupling is enhanced with a reduced interlayer distance, but thermal expansion upon temperature increase tends to decouple adjacent layers and therefore decreases the splitting energy. Our findings that shed light on the distinctive behaviors about VBM splitting in layered MoS2 may apply to other hexagonal TMDs as well. They will also be helpful in extending our understanding of the TMD electronic structure for potential applications in electronics and optoelectronics.

摘要

作为一种典型的二维过渡金属二硫属化物(TMD),层状 MoS2 的电子结构是量子限制、层间相互作用和晶体对称性共同作用的结果。价带中的显著能隙分裂导致了许多有趣的电子、光学和磁现象。尽管已经进行了大量研究,但在少层 MoS2 中实验确定价带分裂的情况仍然缺乏。在这里,我们展示了 MoS2 从一层到五层时价带顶(VBM)是如何分裂的。由于空穴的层间跃迁能较小,因此层间耦合对声子能量的贡献较大,但对双层的 VBM 分裂的贡献较弱。因此,在分裂中,自旋轨道耦合仍然占主导地位。对于单层 MoS2 来说,VBM 分裂具有温度独立性,因此在双层中也可以观察到。然而,在三层到五层的 MoS2 中,VBM 分裂呈现出玻色-爱因斯坦类型的温度依赖性。在这种少层 MoS2 中,随着层间距离的减小,层间耦合得到增强,但温度升高引起的热膨胀会使相邻层解耦,从而降低分裂能量。我们的研究结果阐明了层状 MoS2 中 VBM 分裂的独特行为,这可能也适用于其他六方 TMD。这些发现也有助于我们进一步理解 TMD 的电子结构,为电子学和光电子学领域的潜在应用提供帮助。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验