Tseng Zong-Liang, Chiang Chien-Hung, Wu Chun-Guey
Research Center for New Generation Photovoltaics, National Central University, Jhong-Li, 32001, Taiwan, ROC.
Department of Chemistry, National Central University, Jhong-Li, 32001, Taiwan, ROC.
Sci Rep. 2015 Sep 28;5:13211. doi: 10.1038/srep13211.
Sputtering made ZnO thin film was used as an electron-transport layer in a regular planar perovskite solar cell based on high quality CH3NH3PbI3 absorber prepared with a two-step spin-coating. An efficiency up to 15.9% under AM 1.5G irradiation is achieved for the cell based on ZnO film fabricated under Ar working gas. The atmosphere of the sputtering chamber can tune the surface electronic properties (band structure) of the resulting ZnO thin film and therefore the photovoltaic performance of the corresponding perovskite solar cell. Precise surface engineering of ZnO thin film was found to be one of the key steps to fabricate ZnO based regular planar perovskite solar cell with high power conversion efficiency. Sputtering method is proved to be one of the excellent techniques to prepare ZnO thin film with controllable properties.
溅射制备的ZnO薄膜被用作基于两步旋涂法制备的高质量CH3NH3PbI3吸收体的常规平面钙钛矿太阳能电池中的电子传输层。在Ar工作气体下制备的基于ZnO薄膜的电池在AM 1.5G光照下实现了高达15.9%的效率。溅射室的气氛可以调节所得ZnO薄膜的表面电子性质(能带结构),从而调节相应钙钛矿太阳能电池的光伏性能。发现对ZnO薄膜进行精确的表面工程处理是制备具有高功率转换效率的基于ZnO的常规平面钙钛矿太阳能电池的关键步骤之一。溅射法被证明是制备具有可控性质的ZnO薄膜的优秀技术之一。