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静电门控石墨烯-氧化锌纳米线异质结

Electrostatically Gated Graphene-Zinc Oxide Nanowire Heterojunction.

作者信息

You Xueqiu, Pak James Jungho

出版信息

J Nanosci Nanotechnol. 2015 Mar;15(3):2040-6. doi: 10.1166/jnn.2015.10235.

DOI:10.1166/jnn.2015.10235
PMID:26413618
Abstract

This paper presents an electrostatically gated graphene-ZnO nanowire (NW) heterojunction for the purpose of device applications for the first time. A sub-nanometer-thick energy barrier width was formed between a monatomic graphene layer and electrochemically grown ZnO NWs. Because of the narrow energy barrier, electrons can tunnel through the barrier when a voltage is applied across the junction. A near-ohmic current-voltage (I-V) curve was obtained from the graphene-electrochemically grown ZnO NW heterojunction. This near-ohmic contact changed to asymmetric I-V Schottky contact when the samples were exposed to an oxygen environment. It is believed that the adsorbed oxygen atoms or molecules on the ZnO NW surface capture free electrons of the ZnO NWs, thereby creating a depletion region in the ZnO NWs. Consequentially, the electron concentration in the ZnO NWs is dramatically reduced, and the energy barrier width of the graphene-ZnO NW heterojunction increases greatly. This increased energy barrier width reduces the electron tunneling probability, resulting in a typical Schottky contact. By adjusting the back-gate voltage to control the graphene-ZnO NW Schottky energy barrier height, a large modulation on the junction current (on/off ratio of 10(3)) was achieved.

摘要

本文首次展示了一种用于器件应用的静电门控石墨烯-氧化锌纳米线(NW)异质结。在单原子石墨烯层和电化学生长的氧化锌纳米线之间形成了亚纳米厚的能垒宽度。由于能垒狭窄,当在结两端施加电压时,电子可以隧穿能垒。从石墨烯-电化学生长的氧化锌纳米线异质结获得了近欧姆电流-电压(I-V)曲线。当样品暴露于氧气环境时,这种近欧姆接触转变为不对称I-V肖特基接触。据信,氧化锌纳米线表面吸附的氧原子或分子捕获了氧化锌纳米线的自由电子,从而在氧化锌纳米线中形成耗尽区。结果,氧化锌纳米线中的电子浓度显著降低,石墨烯-氧化锌纳米线异质结的能垒宽度大大增加。这种增加的能垒宽度降低了电子隧穿概率,导致典型的肖特基接触。通过调节背栅电压来控制石墨烯-氧化锌纳米线肖特基能垒高度,实现了对结电流的大幅调制(开/关比为10(3))。

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