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铁电薄膜中的巨介电常数:畴壁乒乓效应

Giant Dielectric Permittivity in Ferroelectric Thin Films: Domain Wall Ping Pong.

作者信息

Quan Jiang An, Jian Meng Xiang, Wei Zhang David, Hyuk Park Min, Yoo Sijung, Jin Kim Yu, Scott James F, Seong Hwang Cheol

机构信息

State Key Laboratory of ASIC &System, School of Microelectronics, Fudan University, Shanghai 200433, China.

National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

出版信息

Sci Rep. 2015 Oct 6;5:14618. doi: 10.1038/srep14618.

Abstract

The dielectric permittivity in ferroelectric thin films is generally orders of magnitude smaller than in their bulk. Here, we discover a way of increasing dielectric constants in ferroelectric thin films by ca. 500% by synchronizing the pulsed switching fields with the intrinsic switching time (nucleation of domain plus forward growth from cathode to anode). In a 170-nm lead zirconate titanate thin film with an average grain size of 850 nm this produces a dielectric constant of 8200 with the maximum nucleus density of 3.8 μm(-2), which is one to three orders of magnitude higher than in other dielectric thin films. This permits smaller capacitors in memory devices and is a step forward in making ferroelectric domain-engineered nano-electronics.

摘要

铁电薄膜的介电常数通常比其体材料小几个数量级。在此,我们发现了一种方法,通过使脉冲开关场与本征开关时间(畴的成核加上从阴极到阳极的正向生长)同步,可将铁电薄膜的介电常数提高约500%。在平均晶粒尺寸为850 nm的170 nm锆钛酸铅薄膜中,这产生了介电常数为8200且最大核密度为3.8 μm⁻²的结果,这比其他介电薄膜高1至3个数量级。这使得存储器件中的电容器更小,是铁电畴工程纳米电子学发展中的一大进步。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7e3b/4594126/3296f14dc525/srep14618-f1.jpg

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