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掺杂 VO2 纳米线中单斜四方相(金红石)转变的原子起源。

Atomic Origins of Monoclinic-Tetragonal (Rutile) Phase Transition in Doped VO2 Nanowires.

机构信息

Department of Mechanical Engineering-Engineering Mechanics, Michigan Technological University , Houghton, Michigan 49933-1295, United States.

Department of Physics, University of Illinois at Chicago , Chicago, Illinois 60607-7059, United States.

出版信息

Nano Lett. 2015 Nov 11;15(11):7179-88. doi: 10.1021/acs.nanolett.5b03219. Epub 2015 Oct 16.

Abstract

There has been long-standing interest in tuning the metal-insulator phase transition in vanadium dioxide (VO2) via the addition of chemical dopants. However, the underlying mechanisms by which doping elements regulate the phase transition in VO2 are poorly understood. Taking advantage of aberration-corrected scanning transmission electron microscopy, we reveal the atomistic origins by which tungsten (W) dopants influence the phase transition in single crystalline WxV1-xO2 nanowires. Our atomically resolved strain maps clearly show the localized strain normal to the (122̅) lattice planes of the low W-doped monoclinic structure (insulator). These strain maps demonstrate how anisotropic localized stress created by dopants in the monoclinic structure accelerates the phase transition and lead to relaxation of structure in tetragonal form. In contrast, the strain distribution in the high W-doped VO2 structure is relatively uniform as a result of transition to tetragonal (metallic) phase. The directional strain gradients are furthermore corroborated by density functional theory calculations that show the energetic consequences of distortions to the local structure. These findings pave the roadmap for lattice-stress engineering of the MIT behavior in strongly correlated materials for specific applications such as ultrafast electronic switches and electro-optical sensors.

摘要

长期以来,人们一直有兴趣通过添加化学掺杂剂来调整二氧化钒(VO2)的金属-绝缘体相变。然而,掺杂元素调节 VO2 相变的潜在机制仍未得到很好的理解。利用相衬校正扫描透射电子显微镜,我们揭示了钨(W)掺杂剂影响单晶 WxV1-xO2 纳米线相变的原子起源。我们原子分辨的应变图清楚地显示了低掺杂 W 的单斜结构(绝缘体)中(122̅)晶格平面垂直方向的局部应变。这些应变图展示了单斜结构中掺杂剂产生的各向异性局部应力如何加速相变并导致四方结构的弛豫。相比之下,由于过渡到四方(金属)相,高掺杂 W 的 VO2 结构中的应变分布相对均匀。方向应变梯度还得到了密度泛函理论计算的证实,该计算显示了局部结构扭曲的能量后果。这些发现为强关联材料中 MIT 行为的晶格应力工程铺平了道路,可用于特定应用,如超快速电子开关和电光传感器。

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