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High-throughput realization of an infrared selective absorber/emitter by DUV microsphere projection lithography.

作者信息

Bonakdar Alireza, Rezaei Mohsen, Dexheimer Eric, Mohseni Hooman

机构信息

Bio-inspired Sensors and Optoelectronics Laboratory (BISOL), Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, IL 60208, USA.

出版信息

Nanotechnology. 2016 Jan 22;27(3):035301. doi: 10.1088/0957-4484/27/3/035301. Epub 2015 Dec 9.

DOI:10.1088/0957-4484/27/3/035301
PMID:26650855
Abstract

In this paper, we present a low-cost and high-throughput nanofabrication method to realize metasurfaces that have selective absorption/emission in the mid-infrared region of the electromagnetic spectrum. We have developed DUV projection lithography to produce arbitrary patterns with sub-80 nm feature sizes. As examples of practical applications, we experimentally demonstrate structures with single and double spectral absorption/emission features, and in close agreement with numerical simulation. The fundamental mechanism of perfect absorption is discussed as well. Selective infrared absorbers/emitters are critical elements in realizing efficient thermophotovoltaic cells and high-performance biosensors.

摘要

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