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双氯芬酸引起的光线性甲脱离。

Diclofenac-Induced Photo-Onycholysis.

作者信息

Al-Kathiri Lutfi, Al-Asmaili Abla

机构信息

Department of Dermatology, Sultan Qaboos Hospital, Salalah, Oman.

Department of Dermatology, Al Nahdha Hospital, Muscat, Oman.

出版信息

Oman Med J. 2016 Jan;31(1):65-8. doi: 10.5001/omj.2016.12.

Abstract

Onycholysis is the detachment of the nail plate from the nail bed. If drug-induced, it can be an isolated phenomenon, but it may also accompany or follow a cutaneous phototoxicity reaction due to drug intake and exposure to ultraviolet irradiation. Photo-onycholysis is a rare photosensitivity reaction due to exposure to either a natural or artificial source of light. Many drugs are responsible for this phototoxic reaction, especially tetracyclines, psoralens, chloramphenicol, non-steroidal anti-inflammatory drugs, fluoroquinolones, and, rarely, doxycycline. Any patient given enough of a therapeutic dose of an inducing drug and sufficient light irradiation can develop phototoxic reactions. While there is no need to avoid these drugs completely, precautions should be taken. Here we have reported the case of a patient who developed onycholysis of his fingernails with sparing of the toenails following administration of diclofenac therapy for lower back pain. The onycholysis was associated with a phototoxic reaction. The swellings resolved totally within two days, and the patient started to notice the separation of all fingernail plates from their nail beds. The patient was treated symptomatically. On follow-up, onycholysis had regressed slowly, and the condition recovered totally within three months without any sequelae.

摘要

甲剥离是指甲板与甲床分离。如果是药物引起的,它可以是一种孤立现象,但也可能伴随或继发于因摄入药物和暴露于紫外线照射而导致的皮肤光毒性反应。光线性甲剥离是一种由于暴露于自然或人工光源而引起的罕见光敏反应。许多药物可导致这种光毒性反应,尤其是四环素类、补骨脂素、氯霉素、非甾体抗炎药、氟喹诺酮类,很少见的还有强力霉素。任何接受足够治疗剂量的诱导药物并受到足够光照的患者都可能发生光毒性反应。虽然无需完全避免使用这些药物,但应采取预防措施。在此,我们报告了一例患者,该患者在接受双氯芬酸治疗下背部疼痛后出现手指甲甲剥离,而脚趾甲未受累。甲剥离与光毒性反应相关。肿胀在两天内完全消退,患者开始注意到所有手指甲甲板与甲床分离。对该患者进行了对症治疗。随访时,甲剥离已缓慢消退,病情在三个月内完全恢复,无任何后遗症。

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